• The Transactions of the Korean Institute of Electrical Engineers D
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• v.53 no.3
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• pp.166-172
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• 2004

Arc Fault Current is an electric discharge which is occurred in two opposite electrode. In this Paper, arc current control algorithm is designed for the interruption of arc fault current which is occurred in the low voltage network. This arc Is one of the main causes of electric fire. Arc fault in electrical network has the characteristics of low current, high impedance and high frequency. Conventional control algorithm does not have the arc current interrupt function. Hence, Control algorithm of arc current is designed for the interruption of arc fault current which has the modified arc characteristics.

• Journal of the Korean Society for Heat Treatment
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• v.23 no.2
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• pp.75-82
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• 2010

A new advanced combined PVD/CVD technique of DLC film deposition has been developed. Deposition of a DLC film was carried out using a pulsed carbon arc discharge in vapor hydrocarbon atmosphere. The arc plasma enhancing CVD process promotes dramatic increase in the deposition rate and decrease of compressive stress as well as improvement of film thickness uniformity compared to that obtained with a single PVD pulsed arc process. The optical spectroscopy investigation reveals great increase in radiating components of $C_2$ Swan system molecular bands due to acetylene molecules decomposition. AFM, Raman spectroscopy, XPS and nano-indentation were used to characterize DLC films. The method ensures obtaining a new superhard DLC nano-material for deposition of protective coatings onto various industrial products including those used in medicine.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.11a
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• pp.183-183
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• 2015

Arc in plasma processing chamber results in high current discharge marks and particles on wafers, but it is hard to identify or observe it during the proc ess. In this paper, we report the observations of plasma arc s during various plasma proc esses through a non-invasive optic al plasma monitoring system (OPMS) devised for the in-situ detec tion of abnormal discharge.

• The Journal of Korea Institute of Information, Electronics, and Communication Technology
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• v.12 no.1
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• pp.78-82
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• 2019

This paper addressed the spectrum of ultrasonic waves produced by arc and/or coronal discharge inside the switchboard. Portable ultrasound sensors are useful for detecting discharge phenomena, such as coronal means in electrical systems. However, a typical handheld ultrasound detector has a disadvantage of determining the type of problem by listening to the sound characteristics and predicting the results, as a result of the determination of whether a discharge is present. Therefore, a new method of analysis is required to distinguish ultrasonic characteristics. In this paper, we published an ultrasound analysis case study to visualize the sound of ultrasonic waves measured with ultrasonic sensors. From the results of the experiment, it was possible to detect coronal discharge and serial arc discharge without interference by the ultrasonic detection system.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.05a
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• pp.185-188
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• 2004

A diode structure of field emission lamps based upon carbon-nanotube is studied. The single-walled carbon nanotubes(SWNTs) were produced by arc discharge method. We made the 1-inch diode type flat lamp using CNTs. We applied anode voltage gradually to refine the field emission behavior of emitter in dynamic vacuum system to study the emission current. the brightness and efficiency, etc. The field emission properties was estimated by varying gaps between the cathode and anode, contents of the glass frit. The good luminous efficiency is showed in the gap $900{\mu}m$, $1200{\mu}m$ and contents of the proper glass frit. For the upper conditions, the luminous efficiencies were respectively 23.30, 11.12 1m/W.

• Korean Journal of Materials Research
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• v.18 no.5
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• pp.253-258
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• 2008

A simple method to deposit carbon nanotube films uniformly on large area substrates using an arc discharge method is reported in this paper. The arc discharge method was modified to deposit carbon nanotube films in situ on the substrates. The substrates were scanned several times over the arcing point for a uniform film thickness. Deposition was carried out under variable dc bias conditions at 600 torr of $H_2$ gas. The thickness uniformity of the single-wall carbon nanotube films as characterized by a four-point probe was within 30% deviation. The morphology and crystal quality of the single-wall carbon nanotube film were also characterized by field emission scanning electron microscopy and Raman spectroscopy.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1700-1701
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• 2007

DC Arc Fault Current is an electric discharge which is occurred in two opposite electrode. In this paper, DC arc detection device is designed for the display of DC arc fault current which is occurred in the local electric network with DC Power. This DC arc is one of the main causes of electric fire. Arc fault in electrical network has the characteristics of low current, high impedance and low frequency. DC Arc current detection device is designed for the display of arc fault current which has the modified arc characteristics.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.378-379
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• 2009

High intensity metal halide discharge lamp performance, specifically the generated luminous flux and light color content, depends critically on the arc tube design. Factors influencing the design and consequent lamp efficacy include : lamp size, geometry, arc tube composition, fill chemistry, electrode design and excitation modes. Shaping of Polycrystalline Alumina(PCA) can be realized by conventional ceramic processes. Several processes are applied nowadays. Well-known in the ceramic high pressure field for decades are the pressing and the extrusion method. Newly developed slurry and precious forming technologies give the one-body seamless tubes, which improve thickness uniformity and lighting performance. Now, we reported some optical properties with different arc tube structures of ceramic metal halide lamps.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.36 no.9
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• pp.655-659
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• 1987

This study presents a model of the electrical characteristics of the high-pressure mercury vapour arc discharge. Energy balance equation per unit volume of the arc tube is converted into the one per unit length by assuming the parabolic radial temperature distribution and integrating over the cross-section of the tube. Using this energy balance equation, together with the circuit equation and Ohm's law, the arc voltage and current variation for 1 cycle is numerically calculated and a good result is obtained. A simple method to calculate the axis temperature of the arc tube and the radiation output is also presented.