• Proceedings of the SAREK Conference
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• 2008.11a
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• pp.537-540
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• 2008

A numerical study has been carried out on the optimization of an air cleaning system which was installed in a heating, ventilation and air conditioning system (HVAC) system of subway station for particle removal. Required particle removal efficiencies of three different air cleaning systems were calculated from ventilation rate, and indoor/outdoor concentration of PM10. Mass balance equations of PM10 were used to solve the required particle removal efficiencies. Fibrous filter was considered as an air cleaning system. Calculations were carried out about two different places which were waiting area and platform of subway station, respectively. This study proposed optimized design and operation condition of each air cleaning system.

• 제어로봇시스템학회:학술대회논문집
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• 2005.06a
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• pp.1309-1312
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• 2005

A multi-chemical supply system is developed and applied to a wet station, which uses the multi-chemical process in one bath. To control the concentration of two chemicals, control logic of a supply pump is programmed using the programable logic controller (PLC). By using the multi-chemical supply system, wet station with single bath is applied to cleaning process using multi chemicals such as buffed oxide etchant (BOE) and standard clean 1 (SC-1). The concentration of each chemical is measured in the bath to verify the multi-chemical supply system. The control range in the each chemical concentration is measured to 1.33weight% in NH4OH and 0.23weight% in H2O2. The multi-chemical supply system can be movable and usable as an independent module of fixed wet station. By simply midifying the PLC, a multi-chemical supply system can be developed for a wet station.

• Journal of the Semiconductor & Display Technology
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• v.4 no.3 s.12
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• pp.29-33
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• 2005

As the integrated devices become more and more sophistcated, the diameter of wafers increased up to 300 mm and strict level of cleaning is necessary to remove the particulates on the surface of wafer. Therefore we need a new type of wet-station which can reduce DI water and chemical in the cleaning process. Moreover, it is important to control the temperature and the concentration of chemical in the wet-station. In the conventional chemical supply system, it is difficult not only to fit the mixing rate of chemicals in cleaning process, but also to fit the quantity and temperature. Thus, we propose a new chemicals supply system, which overcomes above problems by the analysis of fluid and thermal transfer on chemical supply system.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2011.06a
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• pp.373-374
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• 2011

• Proceedings of the Korean Institute of Intelligent Systems Conference
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• 2004.04a
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• pp.149-152
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• 2004

Generally the wafer is increased by 300mm. We are desired that the wafer is prevented from pollutions of metal contaminant on surface of wafer. We have to develop new wafer cleaning process of IC Manufacturing that can reduce DI water and chemical by removal of the wafer cleaning process step. Moreover, it is difficult to control temprature and density of chemical in spite of rapidly increasing automation of system. We design smart module controller for new generation of semiconductor wet station with intelligent algorithm using data that is taken by computer simulation for optimal system.

• Proceedings of the KIEE Conference
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• 2001.07d
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• pp.2649-2650
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• 2001

In this paper, the minimization of particle wit introduction of face to face to face type in cleaning. Easy input and change of parameter Monitoring function of process data in process function of 3 moving axis. Return Tank for Chem : cal solution.

• The Transactions of the Korea Information Processing Society
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• v.6 no.5
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• pp.1385-1392
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• 1999

This paper describes the design of the monitoring system for monitoring the current status and indirect controlling of the Wet Station Equipment which is used for cleaning the wafer. Most of the conventional monitoring system depend on the special hardware and software. Basic design goal of monitoring system is provide the convenience for the use and the portability for the system. In order for the system to fulfil its requirements, it was designed using GUI (Graphical User Interface) facility based on the windows NT environment of IBM PC compatible and EtherNet board based on the TCP/IP protocol.

• Journal of the Semiconductor & Display Technology
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• v.10 no.2
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• pp.109-113
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• 2011

Hot air flow simulations of the wet station dryer module for the solar cell cleaning were conducted. Air incident angles such as to the substrates ($45^{\circ}$), to the bottom ($90^{\circ}$), and to the wall ($135^{\circ}$) were considered. Based on the simulated velocity and temperature profiles, appropriate incident angle was proposed, and it was well matched to experimental results. Additionally, uniform and non-uniform air hole sizes of the tube were compared for the uniform air flow distribution through the batch.

• 한국태양에너지학회:학술대회논문집
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• 2009.11a
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• pp.279-284
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• 2009

Traditionally, so-called "industrial waste gases", such ad exhaust from boilers at industrial installations and a large quantity of soot discharged from power station, before their release into the atmosphere, have been on occasion subjected to an air cleaning process to remove fine particles that may pollute the atmosphere (such as mist and dust containing various powdery or oily substances and moisture from industrial waste gases). The release of industrial waste gases containing these particles directly into the atmosphere poses a serious threat to the earth environment; and recovery of these noxious substances is required by law in some countries and local governments. in urban areas, air pollution from automobile exhaust and others creates a serious condition. Some homes are equipped with and use indoor air purifiers. In many of the kitchens of restaurants, smoke generated during cooking and otherwise contaminated air are cleansed by air purifiers before being released outside or recycled inside. For the dust collecting devices to recover the fine particles contained in contaminated air, the cause for air pollution and how to purify air, many types based on various principles are known. Specifically, classified based on theories of particle collection, filtration, gravity, inertia, centrifugation, electricity, and cleaning types are cited as available processes. Among them, an appropriate type is selected according to the size or type of fine particles to be collected and conditions for installation. For the efficiency of dust collection, a filtration system (by using bag filters and others) and electric system are particularly outstanding and are therefore used widely in various areas of industry. In this research, rotary type high performance oil mist and smoke collecting system with self auto cleaning device equipped with the cleaning fluid spraying section is investigated.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2005.05a
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• pp.157-162
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• 2005

The wafer's size has been increased up to 300mm according as the devices have been integrated sophisticatedly. For this process to make 300mm-wafer, it is required strict level which removes the particulates on the surface of wafer. Therefore we need new type wet-station which can reduce DI water and chemical in the cleaning process. Moreover, it is very important to control the temperature and the concentration of chemical wet-stat ion. The chemical supply system which is used currently is not only difficult to make a fit mixing rate of chemical in cleaning process, but also it is difficult to make fit quantity and temperature. We propose new chemical supply system, which overcomes the problems via analysis of fluid and thermal transfer on chemical supply system,