• Title/Summary/Keyword: fresnel diffraction

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Fresnel Diffraction and Fraunhoffer Diffraction (TEM 관련 이론해설 (1): 프레넬 회절과 프라운호퍼 회절)

  • Lee, Hwack-Joo
    • Applied Microscopy
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    • v.32 no.2
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    • pp.81-90
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    • 2002
  • In this review, the author discussed how the Fresnel and Fraunhoffer Diffraction can be deduced from the Huygens-Fresnel principle and Kirchhoff Diffraction Theory. Fresnel diffraction became the basic theory of the CTEM image theory, and Fraunhoffer diffraction became the base for electron diffraction and HRTEM image theory by Fourier transformation. The author also discussed the diffraction based on Born series.

Hologram Watermarking Using Fresnel Diffraction Model (Fresnel 회절 모델을 이용한 홀로그램 워터마킹)

  • Lee, Yoon-Hyuk;Seo, Young-Ho;Kim, Dong-Wook
    • Journal of Broadcast Engineering
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    • v.19 no.5
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    • pp.606-615
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    • 2014
  • This paper is to propose an algorithm for digital hologram watermarking by using a characteristic of the Fresnel diffraction model in 2D image. When 2D image is applied Fresnel transform, the result concentrates center region. When applied to a hologram, on the other hand, the result focused diffraction pattern of 2D form. Using this characteristic, to generate diffraction model by applying 2-th Fresnel transform to the hologram. Corner of diffraction model is mark space. This mark space is embedded watermark and extracted watermark. Experimental results showed that all the extracted watermarks after several kinds of attacks (Gaussian blurring, Sharpening, JPEG compression) showed visibilities good enough to be recognized to insist the ownership of the hologram.

Optical Analysis of Diffraction Grating and Fresnel Zone Plate Fabricated on Fused Silica Glass by a Femtosecond Laser (펨토초 레이저를 이용한 회절격자와 Fresnel Zone Plate 제작 및 광학적 분석)

  • Ryu, Jin-Chang;Kim, Jin-Tae;Sohn, Ik-Bu
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.3
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    • pp.18-26
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    • 2010
  • Diffraction gratings with precise spatial periods of 2 ${\mu}m$ and 5 ${\mu}m$ have been fabricated by using a femtosecond laser which does not have limits on materials of micromachining and small thermal effects due to high peak power. Diffraction angle and diffraction efficiency of those were measured. Simulation results of diffraction angle and diffraction efficiency of the diffraction grating calculated with the parameters such as line width, depth, and spatial period of the fabricated gratings were compared with experimental results measured with a He-Ne laser. Besides these, Fresnel Zone Plates (FZPs) with focal distances of 50 mm and 25 mm were fabricated and focal distances of fabricated FZP were measured. Those experimental results for diffraction gratings and FZPs match well with experimental results.

Fully Phase-based Optical Encryption System Using Computer Holography and Fresnel Diffraction (컴퓨터 홀로그래피와 프레넬 회절을 이용한 위상 영상 광 암호화 시스템)

  • 윤경효;신창목;조규보;김수중;김철수;서동환
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.11
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    • pp.43-51
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    • 2004
  • In this paper, we propose a high-level optical encryption system, which is tolerant with noises and cropping, by encrypting the phase-encoded CGH pattern of original image with the phase-encoded Fresnel diffraction pattern of random key images. For encryption, the phase-encoded CGH pattern of original image is multiplied by conjugate components which are the phase-encoded Fresnel diffraction patterns of random key images. The original information can be reconstructed by multiplying encrypted image by phase-encoded Fresnel diffraction pattern of random key images and performing Fourier transform of the multiplication result. The proposed system is robust to noises and cropping due to characteristics of CGH pattern and can guarantee high-level encryption by using Fresnel diffraction information. We verified the validity of proposed system by computer simulations, numerical analysis of noises and cropping effect and optical experiment.

Digital Hologram Encryption Algorithm using Fresnel Diffraction (프레넬 회절을 이용한 디지털 홀로그램 암호화 알고리즘)

  • Lee, Yoon-Hyuk;Seo, Young-Ho;Kim, Dong-Wook
    • Journal of Broadcast Engineering
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    • v.20 no.6
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    • pp.807-817
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    • 2015
  • This paper is to propose an encryption method for only an allowed user to see the content for a digital hologram, that is a high value-added content. This paper uses a characteristic of Fresnel transform that the object region is concentrated to a relatively small part of the diffraction plane. By encrypting the concentrated part only the region to be encrypted and in turn the amount of data to be encrypted is reduced a lot, which results in an high efficiency with low encryption rate. As the methodology, a digital hologram is first Fresnel transformed for reconstruction and the result is secondly Fresnel transformed to concentrate the energy into the center of the diffraction plane to encrypt the concentrated region only. For the 2nd transform, energy concentration degree is determined by adjusting the diffraction distance and encryption strength is determined by adjusting the scaling factor. For this we analyze the optimal encryption area according to the diffraction distance and the scaling factor. When applying the proposed method with diffraction distance of 20m the object information was visually unrecognizable with the encryption ratio only 0.005% ~ 0.02%.

Surface Relief Hologram Mask Recording Simulation and Optimization Based on SDTA in the Fresnel Diffraction Zone (Fresnel 영역에서의 SDTA 방법을 이용한 전산묘사에 의한 Surface Relief Hologram Mask 기록 조건 최적화)

  • Lee, Sung-Jin;Dominguez-Caballero, Jose;Barbastathis, George
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.33 no.8
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    • pp.793-798
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    • 2009
  • In this paper, the simulation and optimization of SRH (Surface Relief Hologram) masks for printing LCD gate patterns using TIR (Total Internal Reflection) holographic lithography was investigated. A simulation and optimization algorithm based on SDTA (Scalar Diffraction Theory Analysis) method was developed. The accuracy of the algorithm was compared to that of the RCWA (Rigorous Coupled Wave Analysis) method for estimating the Fresnel diffraction pattern of Cr amplitude masks for the given system geometry. In addition, the results from the optimization algorithm were validated experimentally. It was found that one to the most important conditions for the fabrication of SRH masks is to avoid nonlinear shape distortions of the resulting grating. These distortions can be avoided by designing SRH masks with recorded gratings having small aspect ratios of width versus depth. The optimum gap size between the Cr and SRH masks was found using the optimization algorithm. A printed LCD gate pattern with a minimum line width of $1.5{\mu}m$ exposed using the optimized SRH mask was experimentally demonstrated.

AKALYSIS OF DIFFRACTION OVER AN OBSTACLE AND AN APERTERE WITH RECTANGULAR TYPE (구형 OBSTACLE과 APERTURE에 대한 회절 해석)

  • 홍재운;김시천;홍의석
    • Proceedings of the Korean Institute of Communication Sciences Conference
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    • 1988.10a
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    • pp.126-130
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    • 1988
  • In this paper the intensity variation of electromagnedtic wave is computed with Huygens Fresnel’s theory using diffraction plaenomethon. An obstacle or an aperture with pertangular type between a transmitter and a receiver is consider and the frequency is selcetde in a car phone system band(870~1500MHz) For numerical analysis Fresnel integral equation is developed which is based on the Kirchhoff’s diffraction theory. The result with the obstacle’s dimension from finite value to extremely large confirms the validity of computer simulation.

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Spectral Analysis of Arrayed Waveguide Grating (Arrayed Waveguide Grating의 스펙트럼해석)

  • Jung, Jae-Hoon
    • Journal of IKEEE
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    • v.8 no.1 s.14
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    • pp.121-127
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    • 2004
  • We performed the spectrum analysis of arrayed waveguide grating using Fresnel Kirchhoff diffraction formula and its approximated Fraunhofer diffraction equation and applied both methods to 16 channel and 40 channel models. We presented the spectra and found out the limitations of Fraunhofer diffraction in analysis of arrayed waveguide grating and compared the errors coming from Fraunhofer diffraction approximation and due to imperfection during the fabrication process.

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Simulation of an X-ray Fresnel Zone Plate with Nonideal Factors

  • Chen, Jie;Fan, Quanping;Wang, Junhua;Yuan, Dengpeng;Wei, Lai;Zhang, Qiangqiang;Liao, Junsheng;Xu, Min
    • Current Optics and Photonics
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    • v.4 no.1
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    • pp.9-15
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    • 2020
  • Fresnel zone plates have been widely used in many applications, such as x-ray telescopes, microfluorescence, and microimaging. To obtain an x-ray Fresnel zone plate, many fabrication methods, such as electron-beam etching, ion-beam etching and chemical etching, have been developed. Fresnel zone plates fabricated by these methods will inevitably lead to some nonideal factors, which have an impact on the focusing characteristics of the zone plate. In this paper, the influences of these nonideal factors on the focusing characteristics of the zone plate are studied systematically, by numerical simulations based on scalar diffraction theory. The influence of the thickness of a Fresnel zone plate on the absolute focusing efficiency is calculated for a given incident x-ray's wavelength. The diffraction efficiency and size of the focal spot are calculated for different incline angles of the groove. The simulations of zone plates without struts, with regular struts, and with random struts are carried out, to study the effects of struts on the focusing characteristics of a zone plate. When a Fresnel zone plate is used to focus an ultrashort x-ray pulse, the effect of zone-plate structure on the final pulse duration is also discussed.

A Study on the Machining of Fresnel Lens Mould (Fresnel 렌즈 금형 가공기술 연구)

  • Je, Tae-Jin;Hwang, Gyeong-Hyeon;Lee, Eung-Suk;Kim, Jae-Gu
    • 연구논문집
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    • s.25
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    • pp.105-113
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    • 1995
  • Fresnel lenses are developed for flat optics with the optical characteristics close to aspherical lens such as sharp focusing and dispersion instead of spherical or aspherical surface. Usually, these fresnel lenses and diffraction gratings are machined by high-energy beam such as electron beam machining, but recently with the development of ultra precision machine tool and machining technology, 3-dimension micro machining becomes preferable. This study on the micro machining of fresnel lens is carried out to develop the basic technology of ultra precision micro machining. The machined lens mold will be used for the manufacturing of fresnel lens with 120mm focal distance using synthetic resin material with 1.49 refractive index(PMMA), and the shape of lens is 48mm diameter, $300\mum$ pitch and about $5-700\mum$depth of groove in brass.

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