• Title/Summary/Keyword: ion beam optics

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Characteristics of Ir-Re Thin Films on WC for Lens Glass Molding by Ion Beam Assisted DC Magnetron Sputtering (Ion beam assisted DC magnetron sputtering에 대한 렌즈 유리 성형용 WC 합금의 Ir-Re 박막 특성)

  • Park, Jong-Seok;Park, Burm-Su;Kang, Sang-Do;Yang, Kook-Hyun;Lee, Kyung-Ku;Lee, Doh-Jae;Lee, Kwang-Min
    • Journal of the Korean institute of surface engineering
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    • v.41 no.3
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    • pp.88-93
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    • 2008
  • Ir-Re thin films with Ti interlayer were deposited onto the tungsten carbide substrate by ion beam assisted DC magnetron sputtering. The Ir-Re films were prepared with targets of having two atomic percent of 7:3 and 5:5. The microstructure and surface analysis of the specimen were conducted by using SEM, XRD and AFM. Mechanical properties such as hardness and adhesion strength of Ir-Re thin film also were examined. The interlayer of pure titanium was formed with 100 nm thickness. The film growth of Ir-30at.%Re was faster than that of Ir-50at.%Re in the same deposition conditions. Ir-Re thin films consisted of dense and columnar structure irrespective of the different target compositions. The values of hardness and adhesion strength of Ir-30at.%Re thin film coated on WC substrate were higher than those of Ir-50at.%Re thin film.

Characteristics of TiN Films by ion Beam Assisted Deposition (이온빔 보조 증착에 의한 TiN 박막의 특성)

  • Kim, Sang Hyun;Kim, Dae Hyeon
    • Journal of Korean Ophthalmic Optics Society
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    • v.9 no.1
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    • pp.161-166
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    • 2004
  • In this research, TiN films has been grown to the stainless steel substrate by ion beam assisted deposition. TiN film was grown to the nitrogen atmosphere of around $10^{-15}$ Torr with Arion bombardment. The chemical composition, color and adhesion of TiN films were examined as a variation of En(ion energy per atom). The N/Ti ratio increased linearly as the increase of En and saturated around 1.2 at high En. As a results, the bright golden color was obtained when En reached a certain value of Ecn. As a results, the N/Ti ratio is about 0.9.

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Effect of surface roughness onto the scattering in low loss mirrors (기판의 표면거칠기와 반사경 산란에 대한 연구)

  • 조현주;신명진;이재철
    • Korean Journal of Optics and Photonics
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    • v.13 no.3
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    • pp.209-214
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    • 2002
  • The effect of surface roughness on mirror scattering has been studied. Five kinds of substrates with different surface roughness were fabricated. On those substrates, a dielectric multi-layer coating with high reflectivity was deposited by ion beam sputtering and electron beam evaporation. A total integrated scattering measurement set-up was built for the evaluation of deposited samples. Most of the ion beam sputtered mirrors showed lower scattering than the electron beam evaporated one, which deposited on substrates similar in surface roughness. Over ~2 $\AA$ in surface roughness, scattering strongly depend on the micro-structure of the super-polished surface. The lowest scattering we have achieved is 2.06 ppm by ion beam sputtering from the substrate with surface roughness of 0.23 $\AA$.

Low Energy Ion-Surface Reactor

  • Choi, Won-Yong;Kang, Tae-Hee;Kang, Heon
    • Bulletin of the Korean Chemical Society
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    • v.11 no.4
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    • pp.290-296
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    • 1990
  • Ion-surface collision studies at low kinetic energies (1-100 eV) provide a unique opportunity for investigating reactions and collision dynamics at surfaces. A special ion optics system for generating an energy- and mass-selected ion beam of this energy is designed and constructed. An ultrahigh vacuum (UHV) reaction chamber, in which the ions generated from the beamline collide with a solid surface, is equipped with Auger electron spectroscopy (AES) and thermal desorption spectrometry (TDS) as in-situ surface analytical tools. The resulting beam from the system has the following characteristics : ion current of 5-50 nA, energy spread < 2eV, current stability within ${\pm}5%,$ and unit mass resolution below 20 amu. The performance of the instrument is illustrated with data representing the implantation behavior of $Ar^+$ into a graphite (0001) surface.

In-situ Measurements of the Stress in $TiO_2$ Thin Films ($TiO_2$ 박막의 두께에 따른 실시간 스트레스 측정에 관한 연구)

  • 한성홍
    • Korean Journal of Optics and Photonics
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    • v.4 no.3
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    • pp.260-265
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    • 1993
  • An in-situ stress measurement interferometer is constructed and used to measure the intrinsic stress in Ti$O_2$ thin films during their growth by ion-assisted deposition. It is found that the stress increases with the momentum transferred by the ion beam to the growing film and is fairly well agreed with Windischmann's model. The variation of the stress with thickness is qualitatively explained in terms of the balance between the compressive stress produced by the ion beam and the surface diffusion determined by the surface temperature.

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