• Title, Summary, Keyword: photolithography

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Optimization of Laser Photolithography Micromachining Technique based on Taguchi Method (다구찌 방법을 이용한 레이저 포토리소그라피 미세패턴가공 기술의 최적화)

  • Baek, Nam-Kook;Kim, Dae-Eun
    • Proceedings of the KSME Conference
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    • pp.871-875
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    • 2001
  • Laser photolithography technique is useful for fabricating micro-patterns of silicon wafers. In this work, the laser photolithography micromachining technique is optimized based on Taguchi method. Sensitivity analysis was performed using laser scanning speed and laser power level as the parameters. The results show that for the photoresist used in this work, a laser scan speed of $70{\mu}m/s$ at 50mW laser power gives the best result.

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Advanced Process Control of the Critical Dimension in Photolithography

  • Wu, Chien-Feng;Hung, Chih-Ming;Chen, Juhn-Horng;Lee, An-Chen
    • International Journal of Precision Engineering and Manufacturing
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    • v.9 no.1
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    • pp.12-18
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    • 2008
  • This paper describes two run-to-run controllers, a nonlinear multiple exponential-weight moving-average (NMEWMA) controller and a dynamic model-tuning minimum-variance (DMTMV) controller, for photolithography processes. The relationships between the input recipes (exposure dose and focus) and output variables (critical dimensions) were formed using an experimental design method, and the photolithography process model was built using a multiple regression analysis. Both the NMEWMA and DMTMV controllers could update the process model and obtain the optimal recipes for the next run. Quantified improvements were obtained from simulations and real photolithography processes.

Scheduling Algorithms for Minimizing Total Weighted Flowtime in Photolithography Workstation of FAB (반도체 포토공정에서 총 가중작업흐름시간을 최소화하기 위한 스케쥴링 방법론에 관한 연구)

  • Choi, Seong-Woo
    • Journal of the Society of Korea Industrial and Systems Engineering
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    • v.35 no.1
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    • pp.79-86
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    • 2012
  • This study focuses on the problem of scheduling wafer lots of several recipe(operation condition) types in the photolithography workstation in a semiconductor wafer fabrication facility, and sequence-dependent recipe set up times may be required at the photolithography machines. In addition, a lot is able to be operated at a machine when the reticle(mask) corresponding to the recipe type is set up in the photolithography machine. We suggest various heuristic algorithms, in which developed recipe selection rules and lot selection rules are used to generate reasonable schedules to minimizing the total weighted flowtime. Results of computational tests on randomly generated test problems show that the suggested algorithms outperform a scheduling method used in a real manufacturing system in terms of the total weighted flowtime of the wafer lots with ready times.

Region-based Pattern Generating System for Maskless Photolithography

  • Jin, Young-Hun;Park, Ki-Won;Choi, Jae-Man;Kim, Sang-Jin;An, Chang-Geun;Seo, Man-Seung
    • 제어로봇시스템학회:학술대회논문집
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    • pp.389-392
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    • 2005
  • In the maskless photolithography based on the Digital Micromirror Device (DMD) by Texas Instruments Inc. (TI), the micromirror array works as a virtual photomask to write patterns directly onto Flat Panel Display (FPD) at high speed with low cost. However, it is neither simple to generate region-based patterns for the micromirror array nor easy to deliver sequences of patterns for the micromirror controller. Moreover, the quality of lithography yields the precise synchronization between generating sequence of patterns and irradiation rate off micromirrors. In this study, the region-based pattern generating system for maskless photolithography is devised. To verify salient features of devised functionalities, the prototype system is implemented and the system is evaluated with actual DMD based photolithography. The results show that proposed pattern generating method is proper and reliable. Moreover, the devised region-based pattern generating system is robust and precise enough to handle any possible user specified mandate and to achieve the quality of photolithography required by FPD manufacturer.

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Simulation Software for Semiconductor Photolithography Equipment: TrackSim (반도체 포토 장비의 시뮬레이션 소프트웨어: TrackSim)

  • Yoon, Hyun-Joong;Kim, Jin-Gon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.13 no.8
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    • pp.3319-3325
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    • 2012
  • This paper describes the development of the TrackSim, which is a discrete event simulation tool for photolithography equipment of semiconductor industry. The TrackSim is focused on the accurate simulation model of the photolithography equipment and easy-to-use user interfaces. TrackSim provides 3D simulation environment for evaluating, validating, and scheduling the photolithography process. One of the major characteristics of TrackSim is in that it is developed based on Applied Materials' AutoMod, a discrete event simulation software broadly used in semiconductor industry. Accordingly, the photolithography model of TrackSim can be used to perform simulation connected with other simulation models built with AutoMod.

Exposure to Volatile Organic Compounds and Possibility of Exposure to By-product Volatile Organic Compounds in Photolithography Processes in Semiconductor Manufacturing Factories

  • Park, Seung-Hyun;Shin, Jung-Ah;Park, Hyun-Hee;Yi, Gwang-Yong;Chung, Kwang-Jae;Park, Hae-Dong;Kim, Kab-Bae;Lee, In-Seop
    • Safety and Health at Work
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    • v.2 no.3
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    • pp.210-217
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    • 2011
  • Objectives: The purpose of this study was to measure the concentration of volatile organic compound (VOC)s originated from the chemicals used and/or derived from the original parental chemicals in the photolithography processes of semiconductor manufacturing factories. Methods: A total of four photolithography processes in 4 Fabs at three different semiconductor manufacturing factories in Korea were selected for this study. This study investigated the types of chemicals used and generated during the photolithography process of each Fab, and the concentration levels of VOCs for each Fab. Results: A variety of organic compounds such as ketone, alcohol, and acetate compounds as well as aromatic compounds were used as solvents and developing agents in the processes. Also, the generation of by-products, such as toluene and phenol, was identified through a thermal decomposition experiment performed on a photoresist. The VOC concentration levels in the processes were lower than 5% of the threshold limit value (TLV)s. However, the air contaminated with chemical substances generated during the processes was re-circulated through the ventilation system, thereby affecting the airborne VOC concentrations in the photolithography processes. Conclusion: Tens of organic compounds were being used in the photolithography processes, though the types of chemical used varied with the factory. Also, by-products, such as aromatic compounds, could be generated during photoresist patterning by exposure to light. Although the airborne VOC concentrations resulting from the processes were lower than 5% of the TLVs, employees still could be exposed directly or indirectly to various types of VOCs.

Continuous Photolithography by Roll-Type Mask and Applications (롤타입 마스크를 이용한 연속 포토리소그래피 기술과 그 응용)

  • Kwak, Moon-Kyu
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.36 no.10
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    • pp.1011-1017
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    • 2012
  • We report the development of an optical micro-nanolithography method by using a roll-type mask. It includes phase-shift lithography and photolithography for realizing various target dimensions. For sub-wavelength resolution, a structure is achieved using the near-field exposure of a photoresist through a cylindrical phase-mask, allowing high-throughput continuous patterning. By using a film-type metal mask, continuous photolithography was achieved, and this method could be used to control the period of resultant patterns in real time by changing the rotating speed of the cylinder mask. As an application, we present the fabrication of a transparent electrode in the form of a metallic mesh by using the developed roll-type photolithography process. As a result, a transparent conductor with good properties was achieved by using a recently built cylindrical phase-shift lithography prototype, which was designed for patterning on 100-mm2 substrates.

A study on Photolithography of band pass filter for communication devices (통신기기용 대역통과필터의 공정에 관한 연구)

  • Lee, Dong-Yoon;Shin, Yong-Deok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • pp.247-250
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    • 2002
  • SAW filters were fabricated on $LiNbO_3$ substrates to evaluate frequency response and properties of photolithography. In the both of etch and lift-off methods, lift off method was superior to etch method in fabrication process. Frequency response property was measured by network analyzer. From measurement of acoustic property, SAW propagation velocity was 3574.9m/sec for $LiNbO_3$ SAW filter.

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The effect of size on friction property of micro-dimple surface to fabricate by photolithography (Photolithography 를 이용한 micro-dimple 크기에 따른 미끄럼 마찰거동)

  • 채영훈;김석삼
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • pp.217-222
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    • 2004
  • The aim of this paper is to investigate the effect of micro-dimple size on reduction friction and to understand the potential of friction reduction through micro-scale dimple to fabricate by photolithography on pin-on-disk test using flat-on-flat contact geometry. It was verify that the friction property with respect to the same pitch has been influence on the size of dimple under lubricated sliding contact. Also, we can recognize from Stribeck curve that the friction property has a connection with the size of dimple. It can explain a relationship between the friction coefficient and a dimensionless parameter for lubrication condition. The friction property has been an effect on the size of surface texture on reduction friction, not only because the density of dimple, but also because the ratio of diameter/pitch. This ratio of approximately 0.5 is recommend under the tested friction condition. It suggested that the ratio of d/p is an important parameter for surface texture design.

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Photolithography process investment of water soluble photoresist and Organic thin film by using it. (수용성 포토레지스트와 이를 이용한 유기 박막의 photolithography 공정 연구)

  • Kim, Kwang-Hyun;Kim, Gun-Ju;Ryu, Ki.-Sung;Kim, Tae-Ho;Song, Jung-Kun
    • Proceedings of the IEEK Conference
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    • pp.497-500
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    • 2004
  • In this paper, we developed a new photolithography process which used a water-soluble photoresist instead of organic solvent soluble photoresist, defined pentacene thin film. And pentacene OTFTs were fabricated with the water- soluble photolithography process.

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