• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.213-213
• /
• 2011

DC arc plasmatron is powerful plasma source to apply etching and texturing processing. Even though DC arc plasmatron has many advantages, it is difficult to apply an industry due to the small applied area. To increase an effective processing area, we suggest a DC-RF hybrid plasma system. The DC-RF hybrid plasma system was designed and made. This system consists of a DC arc plasmatron, RF parts, reaction chamber, power feeder, gas control system and vacuum system. To investigate a DC-RF hybrid plasma, we used a Langmuir probe, OES (Optical emission spectroscopy), infrared (IR) light camera. For RF matching, PSIM software was used to simulate a current of an impedance coil. The results of Langmuir probe measurements, we obtain a homogeneous plasma density and electron temperature those are about $1{\times}1010$ #/cm3 and 1~4 eV. The DC-RF hybrid plasma source is applied for plasma etching experimental, and we obtain an etching rate of 10 ${\mu}m$/min. through a 90 mm of reaction chamber diameter.

• Journal of Korean Society for Atmospheric Environment
• /
• v.23 no.6
• /
• pp.727-733
• /
• 2007

In this study, a newly developed biotrickling system, combined with a non-thermal plasma reactor, was investigated to effectively treat gaseous contaminants such as VOCs (Volatile Organic Compounds). Three kinds of non-thermal plasmas (NTPs) such as a rod type dielectric barrier discharge (DBD) plasma, a packed bead type DBD plasma and a gliding arc (GA) plasma, were tested and compared in terms of power consumption. The rod type DBD plasma was selected as one for integration with biotrickling system due to its relatively high VOC removal efficiency, low power consumption and low pressure drop. Toluene and xylene as representatives of VOCs were used as test gases. The experiment results showed that the efficiency of biotrickling system was especially very low at the high gas concentration and high flow rate and the removal efficiencies of VOCs were considerably enhanced in the biotrickling system, when the DBD plasma was worked in front of that even at the high gas concentration and high flow rate.

• International journal of advanced smart convergence
• /
• v.10 no.1
• /
• pp.159-165
• /
• 2021

Electronic devices used in the mobile environments fabricated under the plasma conditions in high vacuum system. Especially for the development of advanced electronic devices, high quality plasma as the process conditions are required. For this purpose, the variable conductance throttle valves for controllable plasma employed to the high vacuum system. In this study, we analyzed the effects of throttle valve applications on vacuum characteristics simulated to obtain the optimum design modelling for plasma conditions of high vacuum system. We used commercial simulator of vacuum system, VacSim(multi) on this study. Reliability of simulator verified by simulation of the commercially available models of high vacuum system. Simulated vacuum characteristics of the proposed modelling agreed with the observed experimental behaviour of real systems. Pressure limit valve and normally on-off control valve schematized as the modelling of throttle valve for the constant process-pressure of below 10-3 torr. Simulation results plotted as pump down curve of chamber, variable valve conductance and conductance logic of throttle valve. Simulated behaviors showed the applications of throttle valve sustained the process-pressure constantly, stably, and reliably in plasma process.

• Proceedings of the Korean Society of Propulsion Engineers Conference
• /
• 2011.11a
• /
• pp.694-696
• /
• 2011

The high enthalpy plasma research center in Chonbuk national university is under construction for four types of plasma equipments. The equipments are 1set of 0.4 MW class enhanced Huels type plasma equipment, 1 set of 2.4 MW class enhanced Huels type plasma quipment, 1 set of 60 kW RF plasma equipment and 1 set of 200 kW RF plasma equipment. 60kW RF plasma system is R&D and pilot scale production equipment of nano powder synthesis and plasma spray coating. 200kW RF plasma system is mass production equipment with high power capacity of nano powder synthesis. 0.4MW plasma system can be applied to the ground test facility for material testing under re-entry conditions for space vehicles.

• The Transactions of The Korean Institute of Electrical Engineers
• /
• v.56 no.1
• /
• pp.151-155
• /
• 2007

A compact discharge plasma system with a photocatalyst has been proposed and investigated experimentally for application to air conditioners. It was found that there was intense ultra violet radiation with high energy of 3.2 eV from the corona discharge due to the DC-biased pulse voltage applied on a wire. An electrophotochemical reaction took place apparently on the surfaces of the photocatalyst of $TiO_2$ irradiated ultra violet front the discharge plasma in the proposed plasma system. The proposed discharge plasma system with the photocatalyst of $TiO_2$ showed very high removal efficiency of VOCs by tile additional electrophotochemical reactions on the photocatalyst. The proposed discharge plasma system also showed very high removal efficiency of particles such as smokes, suspended bacteria, and pollen and mite allergens by the electrostatic precipitation part. This type of corona discharge plasma system with a photocatalyst can be used as an effective means of removing both indoor pollutant gases and particles including suspended allergens.

• Journal of the Semiconductor & Display Technology
• /
• v.1 no.1
• /
• pp.35-40
• /
• 2002

Understanding of charging properties of a small particle is necessary to control the particle contamination and to improve productivity of the electronic device in the plasma aided semiconductor manufacturing processes. In this study, the effects of both magnetic field and particle size on the charging properties are experimentally investigated in collisional dusty plasmas. The experiments carried out in the system consisted of a monodisperse particle generation system, a DC magnetized plasma generation system and a charge measurement system. The plasma chamber is made of cross-shape Pyrex surrounded by magnetic bucket (composed of 12 permanent magnetic bar) to confine the plasma. DC magnetic field up to 250G are applied to the plasma zone by external magnetic coil. Previous work shows the charging effect clearly increase with increasing the size of the particle and plasma density, as it was expected.

• Journal of the Korean Society for Precision Engineering
• /
• v.17 no.7
• /
• pp.132-140
• /
• 2000

Plasma arc cutting is one of the most widely used processes in metal cutting fields and is a process that produces parted metal plates by cutting them with an arc plasma established between the electrode tip and the plate(workpiece). When the tip-to-workpiece distance varies during cutting, the cut quality, for example the kerf width, is deteriorated by the change of plasma arc. The variations of tip-to-workpiece distance are due to the different factors such as inaccuracies in setting the torch or workpiece, thermal distortions during cutting, and uneven surface of workpiece. The control to keep the tip-to-workpiece distance constant is thus indispensable to improve the flexibility of automatic plasma arc cutting system applications. In this study, an arc sensor which utilizes the electrical signal obtained from the plasma arc itself was developed. The arc sensor has an advantage that no particular sensing device is necessary and real-time sensing of the tip-to-workpiece distance is possible directly under the plasma arc. The relationship between plasma arc voltage and tip-to-workpiece distance was determined through the repeated experimental results. The model was used for developing an automatic tip-to-workpiece distance control system of plasma arc cutting. It could be shown that the proposed system has a successful capability of tip-to-workpiece distance control.

• Transactions of the Korean hydrogen and new energy society
• /
• v.34 no.1
• /
• pp.8-16
• /
• 2023

In this work, we report basic performance test results of a lab-scale three phase alternative current (AC) arc plasma torch system for plasma gas reforming applications. The suggested system primarily consists of three graphite electrodes inclined at 12.5° to the central axis, a 𝞥 150 mm cylindrical gas path and a three phase-60 Hz AC power supply. At air flow rate of 50 Lpm and arc currents of 100-175 A, test results revealed that plasma resistances were decreasing from 1.08 Ω to 0.53 Ω with the increase of plasma power from 9.3 kW to 13.8 kW, causing the decrease of power factor and increase of the line voltages. However, the injected air can be heated quickly up to the temperatures of >1,200℃ when injecting AC arc plasma powers of >10 kW.

• Transactions of the Korean Society of Automotive Engineers
• /
• v.20 no.2
• /
• pp.70-77
• /
• 2012

The selective catalytic reduction(SCR) system used to reduce NOx in diesel engines requires an NO/$NO_2$ ratio of about 1 in exhaust emissions to realize the fast SCR mode at temperatures lower than $300^{\circ}C$. This study investigated the characteristics of a plasma system as a pre-active apparatus for the fast SCR reaction mode of an SCR system. Plasma was generated by the pulse corona discharge(PCD) method with a four-channel wire-cylinder reactor. This study showed that plasma was easily generated in the exhaust gas by the PCD system, and the peak voltage of the normal state condition for plasma generation was generally 12 kV. The PCD system easily converted NO into $NO_2$ at lower temperatures and the NO/$NO_2$ conversion ratio increased with the discharge current for plasma generation. But the PCD system could not convert NO into $NO_2$ at higher engine speeds and higher engine loads due to the lack of oxygen in exhaust gas. The PCD system also activated the diesel oxidation catalysts(DOC) system to reduce CO emissions.

• The Transactions of the Korean Institute of Power Electronics
• /
• v.15 no.4
• /
• pp.274-281
• /
• 2010

This paper proposes a DFPS (Dual Frequency Power Source) impedance matching device for uniformity improvement of a semiconductor plasma etching system. The DFPS consists of two parts for safe plasma processing on large-area substrates. The first part is an ICP (Inductively Coupled Plasma) for high integration by using ferrite core. The second part is a CCP (Capacitive Coupled Plasma) to control uniformity of whole cells. Proposed DFPS can achieve high productivity improvement required for semiconductor equipment industry. The proposed plasma system is analyzed, simulated and experimentally verified with a matching equipment at 27.12MHz and 400kHz.