• 한국전기전자재료학회논문지
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• 제23권5호
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• pp.353-357
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• 2010

Recently, silicon etching have received much attention for display industry, nano imprint technology, silicon photonics, and MEMS application. After the etching process, removing of etch mask and residue of sidewall is very important. The investigation of the etched mask removing was carried out by using the ashing, HF dipping and acid cleaning process. Experiment shows that oxygen component of reactive gas and photoresist react with silicon and converting them into the mask fence. It is very difficult to remove by using ashing or acid cleaning process because mask fence consisted of Si and O compounds. However, dilute HF dipping is very effective process for SiOx layer removing. Finally, we found optimized condition for etched mask removing.

• Korean Chemical Engineering Research
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• 제48권2호
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• pp.157-163
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• 2010

CRT 용 shadow mask의 생산속도 향상을 위해 첨가제를 투입한 염화제이철 수용액을 개발하였고 이를 shadow mask의 식각속도 향상에 적용하였다. $Fe(ClO_4)_3$ 첨가제를 종래의 식각용액인 염화제이철 수용액에 투입한 결과, shadow mask의 식각속도가 크게 향상되었으며, 이때 첨가제의 농도가 증가할수록 식각속도가 증가함을 알 수 있었다. 또한 첨가제가 투입된 식각용액으로 순수 니켈과 철-니켈 합금(Invar 강)의 식각속도를 비교한 결과, 대부분의 공정조건에서 둘 사이의 식각속도 차이가 작음을 알 수 있었고, 이는 첨가제의 투입에 따라 니켈과 철의 식각속도가 모두 향상된 결과로 해석되었다. 첨가제의 주입에 따라 식각속도가 증가하는 이유는, 첨가제 내의 음이온인 $ClO^{4-}$가 염화제이철 수용액 내의 $Cl^-$에 비해 전자를 이동하는 가교로서의 역할이 우수하여 전자를 더 빠르게 이동시킬 수 있기 때문인 것으로 추정된다.

• 대한통합의학회지
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• 제10권1호
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• pp.149-155
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• 2022

Purpose : This study investigated the effects of wearing a mask and different mask filters on the respiratory function of stroke patients. Methods : A total of 15 stroke patients were selected according to the inclusion and exclusion criteria. The respiratory functions were compared between participants with and without masks and among respiratory functions with three different mask filters. The order of using masks was non-wearing masks, Dental masks, KF80 masks, and KF94 masks; the difference in respiratory volumes among these conditions were measured. For accuracy of the measurement, sufficient education on the respiratory measurement method was provided to the researcher, and the heart rate of the participants was estimated to confirm their stability before the measurements. To ensure accuracy, the subjects were educated on the researchers' respiratory measurement methods. Each measurement was followed by 10 min breathing stability before replacing the next mask. Results : The results of this study showed that the difference in respiratory functions, including forced vital capacity (FVC), forced expiratory volume in the first second (FEV₁), and maximal voluntary ventilation (MVV), in stroke patients was statistically significant among different masks (p<.05). Afterwards, the values of FVC, FEV₁, and MVV in stroke patients wearing masks were significantly lower than those of the non-masked control group (p<.05). The difference in respiratory functions with different mask filters showed no statistical significance (p<.05). Conclusion : This study showed that participants wearing any of the masks presented a lower respiratory function than that of those without using masks; additionally, no difference in respiratory functions was observed with differences in mask filters. Therefore, wearing a mask for a prolonged period is confirmed to affect breathing in stroke patients with weak respiratory function.

• 한국세라믹학회지
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• 제39권12호
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• pp.1124-1127
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• 2002

In this paper, we studied the effects of the electron reflection on shadow mask on which the electron reflecting materials with $WO_3-ZnS:Cu.Al-PbO-SiO_2$ system were screen-printed and we evaluated the variation of the electron beam mislanding in CRT. As a result, the green emitted spectra on the electron reflecting layer are observed due to the transformation of the electron energy, when the electron impacted on shadow mask. The beam mislanding is reduced about 40% in comperision with that of CRT made by the conventional method.

• 한국생산제조학회지
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• 제21권3호
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• pp.408-414
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• 2012

Screen printing is a printing method that uses a woven mesh to support an ink-blocking stencil by transferring ink or other printable materials in order to form an image onto a substrate. Recently, the screen printing method has applied to micro-electronic packaging by using solder paste as a printable material. For the screen printing of solder paste, metal masks containing a number of micro-holes are used as a stencil material. The metal mask undergoes deformation when it is installed in the screen printing machine, which results in the deformation of micro-holes. In the present study, finite element (FE) analysis was performed to predict the amount of deformation of a metal mask. For an efficient calculation of the micro-holes of the metal mask, the sub-domain analysis method was applied to perform FE analyses connecting the global domain (the metal mask) and the local domain (micro-holes). The FE analyses were then performed to evaluate the effects of slot designs on the deformation characteristics, from which more uniform and adjustable deformation of the metal mask can be obtained.

• 반도체디스플레이기술학회지
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• 제15권3호
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• pp.1-5
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• 2016

In order to apply sub-resolution assist feature (SRAF) in extreme ultraviolet lithography, the maximum non-printing SRAF width and lithography process margin needs to be improved. Through simulation, we confirmed that the maximum SRAF width of 6% attenuated phase shift mask (PSM) is large compared to conventional binary intensity mask. The increase in SRAF width is due to dark region's reflectivity of PSM which consequently improves the process window. Furthermore, the critical dimension error caused by variation of SRAF width and center position is reduced by lower change in diffraction amplitude. Therefore, we speculate that the margin of SRAF application will be improved by using PSM.

• 한국정보전자통신기술학회논문지
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• 제13권5호
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• pp.412-418
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• 2020

본 논문은 에칭액(FeCl₃)의 비중을 정확히 제어할 수 있는 자동 액 관리시스템을 제작하여 OLED에 적용되는 SUS MASK 제작하였다. 그리고 홀 직경을 0.4 mm로 목표치를 정하였다. 본 실혐 결과, FeCl₃의 비중(S.G) 값을 1.43에서 1.49까지 변화를 주었을때 에칭 속도는 빨라졌다. 그리고 비중이 1.49일 때, 홀직경이 0.405 mm로의 목표치에 접근한 것을 알 수가 있었다. 압력분사를 2.0 kg/cm2~3.5 kg/cm2까지 변화를 주었을 때 3.0 kg/cm2에서 홀 직경은 평균 0.4 mm로 목표치와 일치하였다. FeCl₃에 HCl과 H2O을 혼합하여 비중을 1.430으로 설정하고 분사 압력을 3.0 kg/cm2으로 고정시키고 첨가제를 1.2%로 적용하여 비중 변화에 따른 특성을 분석하였다. 비중을 1.460 ~ 1.469까지 변화주었을 때 비중이 증가할수록 에칭속도는 0.564에서 0.540으로 빨라졌다. 그리고 비중이 1.467일 때 홀 직경이 0.4 mm로 측정되어 목표치에 도달하였다.

• 한국결정성장학회지
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• 제21권4호
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• pp.164-168
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• 2011

고이온밀도 플라즈마 식각에 의한 고종횡비, 고이방성을 갖는 ZnO, $SnO_2$ 나노 구조 가스 감응층 형성을 위하여 mask 재료들과의 식각 선택도를 조사하였다. $25BCl_3$/10Ar ICP 플라즈마에서는 ZnO와 Ni 간 5.1~6.1 범위의 식각 선택도가 확보된 반면에 Al의 경우 효율적인 식각 선택도를 확보할 수 없었다. $25CF_4$/10Ar ICP 플라즈마에서는 ZnO와 Ni 간에 7~17 범위의 높은 식각 선택도를 얻을 수 있었다. $SnO_2$는 $SnF_x$ 식각 생성물의 높은 휘발성에 기인하여 Ni에 비해 매우 높은 식각 속도를 나타내었고, 최고치 약 67의 매우 높은 식각 선택도를 확보하였다.

• 한국화재소방학회논문지
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• 제29권4호
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• pp.57-60
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• 2015

화재 시 발생하는 독성 가스인 CO, HCl, HCN, $SO_2$를 방독면에 의해 제거하는 효율은 화재로 인한 인명구조의 핵심 요소이다. 머리와 목끈이 없는 탄력있는 방독면은 전방을 주시할 수 있는 창, 탄력후드, 가스정화기와 공기 환풍구로 되어 있어서 화재 시 빠르고 쉽게 착용할 수 있다. 이 연구에서는 이러한 방독면의 CO, HCl, HCN, $SO_2$ 제거 효율에 대한 연구를 진행하였다. 실험결과 CO 제거 효율은 최초 농도가 2505.0 ppm인 경우 3.5분 후에 99.99%였고, 8.5분 후에는 99.98%로 나타났다. 8.5분 후에는 CO 농도가 급격히 증가하는 특성을 보였다. HCl, HCN, $SO_2$에 대해서는 최초 농도가 각각 1003.0, 399.0, 100.3 ppm인 경우 20분 동안 제거 효율이 100%로 나타났다.

• 한국입자에어로졸학회지
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• 제19권1호
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• pp.1-11
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• 2023

Respiratory face masks are protective facepieces that are designed to filter inhaled air. They are easy-to-use devices that can protect the wearer against various hazardous particles in the air. Respiratory face masks also prevent the spread of viruses and bacteria-containing droplets that are released from the coughing or sneezing of the infected people. During the COVID-19 pandemic, various types of face masks have circulated on the market. Their ability to filter sub-micron particles, which are the sizes of harmful particulate matter and airborne viruses, needs to be investigated. Their breathability, the easiness of breath through the mask, also needs to be considered. In this study, wwe evaluated the performance of filters used for different types of face masks certified by different standards including Korean (KF94, KF80, KF-AD), USA (N95), and Chinese (KN95) standards. We also tested the filters of nanofiber masks and surgical masks for which there are no standards for filtration test. The N95 mask filters showed the highest quality factor for capturing virus-sized particles. The other types of mask filters have acceptable performance except for nanofiber mask filters whose performance is very low.