• Proceedings of the Korean Nuclear Society Conference
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• 2005.05a
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• pp.537-538
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• 2005

• Proceedings of the Korean Nuclear Society Conference
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• 2005.05a
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• pp.533-534
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• 2005

• Proceedings of the Korean Nuclear Society Conference
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• 2005.05a
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• pp.539-540
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• 2005

• Journal of the Korean Society of Environmental Restoration Technology
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• v.5 no.5
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• pp.45-57
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• 2002

This study aims to suggest the applied zoning system for preventing reckless developments due to individual industrial facility construction. According to the types of reckless developments which has been found in Hwasung, the applied zoning system including 4 kinds of districts can be proposed. Collective Inducement District can be designated to where many industrial facilities have already existed with poor infrastructure, and the other districts such as Residential Area Protection District, Reservoir-Around and Agricultural Area Protection District, or Landscape Protection District may be designated to the sites where reckless developments due to individual industrial facility construction may happen. This zoning system seems to be used as a guideline of new zoning of revised NLUPL(National Land Use and Plan Law) after the execution.

• Membrane Journal
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• v.1 no.1
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• pp.5-12
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• 1991

Since the discovery of the Loeb-Sourirajan reverse osmosis membrane, thirty years have passed and many membrane technologies and new membranes for applications have been developed in the world. In the early stage of these developments Japan has not contributed much, but from the middle of 70ties Japan has started its own R&D projects starting from the desalination technology, and now various private industries and government ministries are actively engaging in R & D of membrane technologies in Japan. In Table 1 the chronological developments of important events of developments and projects relating membrane technologies inside and outside of Japan are introduced and their details will be explained. The first membrane technology applied in the Japanese industry was a electrodialysis(ED) process using ion-exchange membranes. These membranes were first developed in early 50ties and the Japanese government decided to use this method for concentration of sea-water to produce salt, which was then produced by solar evaporation. This development program started from 1960 by the Japan Monopoly Corp.(at that time). To apply ED process for sea-water concentration it was necessary to develop ion-exchange membranes having very low electric resistance to avoid energy loss due to Joule heat, and those having selectivity to permeate single valent ions only to avoid scale formation in the ED stacks. Three Japanese companies, Asahi Glass, Asahi Chemical and Tokuyama Soda, have succeeded to develop such membranes, and until 1971 all of the seven salt manufacturing companies had adopted ED for production of food salt.

• Corrosion Science and Technology
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• v.6 no.5
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• pp.233-238
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• 2007

Due to the occasional occurrence of a localizedcorrosion such as a SCC and pitting in steam generator tubing(Alloy 600), leading to a significant economical loss, an effective repair technology is needed. For a successful electrodeposition inside a tube, many processes should be developed. Among these processes, an anode to be installed inside a tube, a degreasing condition to remove any dirt and grease, an activation condition for a surface oxide elimination, a strike layer forming condition which needs to be adhered tightly between an electroforming layer and a parent tube and a condition for an electroforming layer should be established. Through a combination of these various process condition parameters, the desired material properties can be acquired. Among these process parameters, various material properties including a mechanical property and its variation along with the height of the electrodeposit inside a tube as well as its thermal stability and SCC resistance should be assessed for an application in a plant. This work deals with the material properties of the Ni electrodeposits formed inside a tube by using the anode developed in this study such as the current efficiency, hardness, tensile property, thermal stability and SCC behavior of the electrodeposit in a 40wt% NaOH solution at $315^{\circ}C$. It was found that a variation of the material properties within the entire length of the electrodeposit was quite acceptable and the Ni electrodeposit showed an excellent SCC resistance.

• Proceedings of the Korea Institute of Fire Science and Engineering Conference
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• 1997.11a
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• pp.606-609
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• 1997

Technology in fire sprinklers has exploded. There is more private fire sprinkler research now than ever before. New technology in fire sprinklers has tested the existing standard and found that it was wrong in some cases, it has provided new sprinklers that control fire better while reducing the cost of the overall system. This expansion of the types and applications of fire sprinklers has created a great need for education for the Authorities Having Jurisdiction and the Engineer as they must be able to make informed decisions regarding this new technology. Significant research has been done at Factory Mutual Research Corporation and Underwriters Laboratory in the United States. Full scale fire testing is done to prove any new technology did not lower the level of protection of existing fire sprinkler system installations. In each and every case, the existing level of fire protection was the baseline against which the new sprinklers were tested. This level can not be lowered for the test to be considered a success. This is intended to be an overview of the developments in fire sprinklers. Although extensive detail is not included, the overall aspects of these developments can be discussed. The research that will be covered will include the following general subjects: high piled and rack storage sprinkler protection without in-rack sprinklers, extended coverage and quick response sprinklers for ordinary and light hazard occupancies, as well as special sprinklers and their applications.

• Journal of the Korean institute of surface engineering
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• v.29 no.5
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• pp.482-486
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• 1996

The progress of microelectronics technology has been requiring agressive developments of device technologies. Also the requirements of the next generation devices is heading to the limits of their functions and materials, and hence asking the very specific silicon wafer such as SOI(Silicon On Insulator) wafer. The talk covers the dome stic and world-wide status of SOI device developments and applications. The presentation will also touch some predictions such as SOI device prgress schedules, impacts on the normal wafer developments, market sizes, SOI wafer prices, and so on. Finally it will cover technical aspects which are silicon oxide conditions for bonding, point defects and, surface contaminations. These points will be hopefully overcome by involved people in microelectronics industry.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.10a
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• pp.443-444
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• 2006

• Proceedings of the Korean Society of Fisheries Technology Conference
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• 2003.05a
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• pp.270-271
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• 2003

The genus of Pseudodiaptomus Herrick, 1884 presently comprises 74 species worldwide extending freshwater to hypersaline water(Walter, 2002). Of these, the post-embryonic developments of their naupliar and copepodid stages have been reported in only eight species: P euryhalinus, P. cornatus, P. richardi inequalis, P. marinus, P. binghami, P. poplesia, P. aurivilli and P. hessei. (omitted)