한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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MWPECVD법에 의한 Diamond박막 성장에 있어서 방전전력과 압력의 영향

Effect of discharge power and pressure in deposition of diamond thin films by MWPECVD

  • 발행 : 1992.11.07
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초록

Diamond thin films by MWPECVD in methane-hydrogen mixed gas were studied, with emphasis on the investigation of the effect of discharge power and pressure. As a result, the growth rate of diamond thin films was affected by discharge power and the surface morphology of diamond thin films was affected by pressure. The growth rate of diamond films was about 1.65 ${\mu}m$/hr under the condition of MW power: 900W, pressure: 60torr, $H_2$ flow rate: 60sccm, $CH_4$ concentration: 1 % and deposition time: 5hr. The deposited diamond films were identified by SEM, XRD and Raman spectrophotometer.

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