Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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The Characteristics of Aluminum Thin Films using DC Magnetron Sputtering

DC Magnetron Sputtering에 의해 증착된 알루미늄 박막의 특성

  • Pyo, Jae-Hwack (Department of Electrical Engineering, Seoul National University) ;
  • Yeon, Chung-Kyu (Department of Electrical Engineering, Seoul National University) ;
  • Whang, Ki-Woong (Department of Electrical Engineering, Seoul National University)
  • 표재확 (서울대학교 공과대학 전기공학과) ;
  • 연충규 (서울대학교 공과대학 전기공학과) ;
  • 황기웅 (서울대학교 공과대학 전기공학과)
  • Published : 1993.11.26
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Abstract

Aluminum thin films were deposited on glass substrate using DC Magnetron Sputtering. Deposition rate, specular reflectance, and resistivity were investigated as a function of the input power, pressure, substrate temperature, and deposition time. Reflectance was reduced with increasing power, also with prolonging deposition time. Topography of the surface, which influences the properties such as electromigration, was observed from scanning electron microscope (SEM) and there was a close relation between the topography and measured reflectance.

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