대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 1993년도 정기총회 및 추계학술대회 논문집 학회본부
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- Pages.258-260
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- 1993
DC Magnetron Sputtering에 의해 증착된 알루미늄 박막의 특성
The Characteristics of Aluminum Thin Films using DC Magnetron Sputtering
- Pyo, Jae-Hwack (Department of Electrical Engineering, Seoul National University) ;
- Yeon, Chung-Kyu (Department of Electrical Engineering, Seoul National University) ;
- Whang, Ki-Woong (Department of Electrical Engineering, Seoul National University)
- 발행 : 1993.11.26
초록
Aluminum thin films were deposited on glass substrate using DC Magnetron Sputtering. Deposition rate, specular reflectance, and resistivity were investigated as a function of the input power, pressure, substrate temperature, and deposition time. Reflectance was reduced with increasing power, also with prolonging deposition time. Topography of the surface, which influences the properties such as electromigration, was observed from scanning electron microscope (SEM) and there was a close relation between the topography and measured reflectance.
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