대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)

대한전기학회 (The Korean Institute of Electrical Engineers)
권호 표지

자화된 플라즈마의 특성 및 식각에의 응용

The characteristics of Magnetized plasma and its applications to Etching

  • 신경섭 (서울대학교 공과대학 전기공학과) ;
  • 이호준 (서울대학교 공과대학 전기공학과) ;
  • 황기웅 (서울대학교 공과대학 전기공학과)
  • Shin, Kyoung-Sop (Department of Electrical Engineering, Seoul National University) ;
  • Lee, Ho-Jun (Department of Electrical Engineering, Seoul National University) ;
  • Whang, Ki-Woong (Department of Electrical Engineering, Seoul National University)
  • 발행 : 1993.11.26
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초록

The effects of the magnetic field and gas pressure on the etching characteristics were investigated in the axial magnetic field enhanced RIE system. This system has many advantages compared with the conventional RIE system ; the capability of operating at low pressure, low self-bias voltage, high electron density and high etch rate in the low pressure, but also has disadvantages such as the nonconformity of plasma density which intensifies as the magnitude of magnetic field increases. To overcome this problem we made some grooved anode and tried to find the optimal pressure and B-field strength.

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