Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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A Study on the Discharge Characteristics of Facing Target Sputtering System and Fabrication of TiN Thin Films

대향전극(對向電極) 스파트링 시스템의 방전특성(放電特性)과 TiN 박모형성(薄膜形成)에 관(關)한 연구(硏究)

  • Lee, Jong-Ho (Dept. of Electrical Engineering University of Ulsan) ;
  • Lee, Kyu-Chul (Dept. of Electrical Engineering University of Ulsan) ;
  • Lee, Tea-Sik (Dept. of Electrical Engineering University of Ulsan) ;
  • Nam, Yong-Su (Dept. of Electrical Engineering University of Ulsan)
  • 이종호 (울산대학교 공과대학 전기공학과) ;
  • 이규철 (울산대학교 공과대학 전기공학과) ;
  • 이태식 (울산대학교 공과대학 전기공학과) ;
  • 남용수 (울산대학교 공과대학 전기공학과)
  • Published : 1993.11.26
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Abstract

In this paper, We were studied the discharge occurrence voltage characteristics. discharge current-discharge voltage characteristics, electron temperature and electron density characteristics on the Facing Tarcket Sputtering System(FTSS) and fabrication of TiN thin films. The discharge occurrence voltage characteristics and discharge current are significantly affected by magnetic flux density. The minimum value of discharge occurrence voltage are obtained about 100[Gauss]. The electron temperature are about 4-8 [eV], and electron density are about $10^{10}cm^{-3}$.

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