Measurements of the Thermally Stimulated Currents for Investigation of the Trap Characteristics in MONOS Structures

MONOS 구조의 트랩특성 조사를 위한 열자극전류 측정

  • 이상배 (광운대학교 전자재료공학과) ;
  • 김주연 (광운대학교 전자재료공학과) ;
  • 김선주 (광운대학교 전자재료공학과) ;
  • 이성배 (광운대학교 전자재료공학과) ;
  • 서광열 (광운대학교 전자재료공학과)
  • Published : 1995.11.01

Abstract

Thermally stimulated currents have been measured to investigate the trap characteristics of the MONOS structures with the tunneling oxide layer of 27${\AA}$ thick nitride layer of 73${\AA}$ thick and blocking oxide layer of 40${\AA}$ thick. By changing the write-in voltage and the write-in temperature, peaks of the I-T characteristic curve due to the nitride bulk traps and the blocking oxide-nitride interface traps ware separated from each other experimentally. The results indicate that the nitride bulk traps are distributed spatially at a single energy level and the blocking oxide-nitride interface traps are distributed energetically at interface.

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