Formation of TiN barrier layer by the two-step rappid thermal conversion process for Cu Metallization

  • Kim, Youn-Tae (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
  • Jun, Chi-Hoon (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
  • Lee, Jin-Ho (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
  • Baek, Jong-Tae (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
  • Yoo, Hyung-Joun (Semiconductor Technology Division, Electronics and Telecommunications Research Institute)
  • Published : 1996.06.01