RF 마그네트론 스퍼터링법을 이용한 MgO 박막의 특성에 관한 연구

A Study on the Characteristics of MgO Thin Film Prepared by RF Magnetron Sputtering Method

Thin films of magnesium oxide(MgO) were deposited on glass substrates by RF magnetron sputtering method. The characteristics of MgO thin films were analyzed as a function of various deposition conditions such as substrate temperature, substrate self-bias, input power and pressure. As the substrate temperature and bias voltage were increased, the grain size of MgO thin film increased. XRD peaks of (111) and (222) direction became dominant, as the substrate bias voltage increases and temperature decreases.