ETCH CHARACTERISTICS OF FERROELECTRIC SrBi$_2$Ta$_2$O$_9$ THIN FILMS IN AN INDUCTIVELY COUPLED PLASMA

  • Chung, Chee-Won (Electronic Materials Lab, Samsung Advanced Institute of Technology) ;
  • Kim, Tae-Young (Electronic Materials Lab, Samsung Advanced Institute of Technology) ;
  • Lee, June-Key (Electronic Materials Lab, Samsung Advanced Institute of Technology) ;
  • Lee, Kyu-Sang (Dept. of Chemistry, Inha Univ.)
  • Published : 1998.08.01