PROPERTIES OF (Ba, Sr)TiO$_3$THIN FILMS DEPOSITED BY MOCVD

  • Park, H.B. (Semiconductor R&D Center, Samsung Electronics Co.) ;
  • Kang, C.S. (Semiconductor R&D Center, Samsung Electronics Co.) ;
  • Yoo, C.Y. (Semiconductor R&D Center, Samsung Electronics Co.) ;
  • Joo, S.H. (Semiconductor R&D Center, Samsung Electronics Co.) ;
  • Kim, W.D. (Semiconductor R&D Center, Samsung Electronics Co.) ;
  • Lee, B.T. (Semiconductor R&D Center, Samsung Electronics Co.) ;
  • Horh, H. (Semiconductor R&D Center, Samsung Electronics Co.) ;
  • Lee, K.H. (Semiconductor R&D Center, Samsung Electronics Co.) ;
  • Lee, S.I. (Semiconductor R&D Center, Samsung Electronics Co.)
  • Published : 1998.08.01