AFM AND TEM STUDIOS OF TWO-DIMENSIONAL DOPANT PROFILES BY USING OF SELECTIVE CHEMICAL ETCHING

  • Choi, C.J. (Dept. of Material Science and Engineering. K-JIST) ;
  • Seong, T.Y. (Dept. of Material Science and Engineering. K-JIST) ;
  • Hwang, H.S. (Dept. of Material Science and Engineering. K-JIST)
  • Published : 1998.08.01