Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)

Materials Research Society of Korea (한국재료학회)
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TRENCH ETCHING FOR SHALLOW TRENCH ISOLATION USING $Cl_2/Ar$ PLASMA

  • Kim, C.B. (Semiconductor Research Division, Hyundai Electronics Industries Co. Ltd.) ;
  • Jun, B.J. (Semiconductor Research Division, Hyundai Electronics Industries Co. Ltd.) ;
  • Kim, J.K. (Semiconductor Research Division, Hyundai Electronics Industries Co. Ltd.) ;
  • Lee, D.D. (Semiconductor Research Division, Hyundai Electronics Industries Co. Ltd.) ;
  • Seol, Y.S. (Semiconductor Research Division, Hyundai Electronics Industries Co. Ltd.)
  • Published : 1998.08.01
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