대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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- Pages.854-856
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- 1999
대향타겟스퍼터링장치에의해 증착된 ZnO 박막의 결정학적 특성
Crystallographic characteristics of ZnO thin films prepared by Facing Targets Sputtering system
- 금민종 (경원대학교 전기전자공학부) ;
- 성하윤 (경원대학교 전기전자공학부) ;
- 공석현 (경원대학교 전기전자공학부) ;
- 손인환 (신성대학 전기과) ;
- 김경환 (경원대학교 전기전자공학부)
- Keum, M.J. (Kyungwon Uni.) ;
- Sung, H.Y. (Kyungwon Uni.) ;
- Kong, S.H. (Kyungwon Uni.) ;
- Son, I.H. (Shinsung college) ;
- Kim, K.H. (Kyungwon Uni.)
- 발행 : 1999.11.20
초록
We prepared ZnO thin film with Facing Targets Sputtering system that can deposit thin film in plasma-free situation and change the deposition condition in wide range. And prepared thin film's c-axis orientation and grain size were analyzed by XRD(x-ray diffractometer). In the results, we suggest that FTS system is very suitable to preparing high quality ZnO thin film with good c-axis orientation.
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