Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2000.07a
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- Pages.608-611
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- 2000
Comparison of E-ICP Effect for Large Area Plasma Source
대면적 플라즈마 소스에의 E-ICP 적용과 그 효과 비교
Abstract
Large area plasma source becomes important as the substrate size increases. In this work, four inductively coupled plasma(ICP) unit sources are distributed 2