한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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- Pages.65-66
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- 2000
Characteristics of fluoride/glass as a seed layer for microcrystalline silicon film growth
- Choi, Seok-Won (School of Electrical and Computer Engineering, Sungkyunkwan University) ;
- Kim, Do-Young (School of Electrical and Computer Engineering, Sungkyunkwan University) ;
- Ahn, Byeong-Jae (School of Electrical and Computer Engineering, Sungkyunkwan University) ;
- Yi, Jun-Sin (School of Electrical and Computer Engineering, Sungkyunkwan University)
- 발행 : 2000.01.13
초록
Various fluoride films on a glass substrate were prepared and characterized to provide a seed layer for crystalline Si film growth. The XRD analysis on
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