$Ru/RuO_{2}$ 이중 전극위에 성장한 PZT 박막의 특성에 관한 연구

The study of the properties of PZT thin films deposited on $Ru/RuO_{2}$ electrode

  • 최장현 (성균관대학교 전기전자 및 컴퓨터공학과) ;
  • 강현일 (성균관대학교 전기전자 및 컴퓨터공학과) ;
  • 박영 (성균관대학교 전기전자 및 컴퓨터공학과) ;
  • 송준태 (성균관대학교 전기전자 및 컴퓨터공학과)
  • 발행 : 2001.11.08

초록

In this paper, in-situ deposited $Ru/RuO_2$ bottom electrodes have been investigated as new bottom electrodes for PZT thin film capacitor application. As a comparison, structural and electrical properties of PZT thin films on Pt/Ti and $RuO_2$ bottom electrodes are also investigated. The use of $Ru/RuO_2$ hybrid electrodes showed better electrical properties in compression with $RuO_2$ bottom electrode. With increasing Ru electrode thickness, the PZT thin films showed preferred orientation along the (110) direction and and leakage current of PZT thin films were improved. The PZT thin films on Ru (100nm)/$RuO_2$ electrodes exhibited excellent ferroelectric properties such as remant polarization and coercive field of $7.2C/cm^2$ and 46.35 kV/cm, respectively.

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