The Outgasing characteristics of MgO film for protecting layer of plasma display panel

  • Song, Byoung-Kwan (Department of Materials Engineering, Sungkyunkwan University) ;
  • Lee, Young-Joon (Department of Materials Engineering, Sungkyunkwan University) ;
  • Lee, Chang-Heon (Department of Materials Engineering, Sungkyunkwan University) ;
  • Hwang, Hyun-Ki (Department of Materials Engineering, Sungkyunkwan University) ;
  • Yeom, Guen-Young (Department of Materials Engineering, Sungkyunkwan University)
  • Published : 2002.08.21

Abstract

In this study, outgassing characteristics of MgO films, and the plasma cleaning effects of the deposited MgO films by atmospheric pressure plasma on outgassing rate were compared. The MgO layer was heated up to 350 $^{\circ}C$ and the outgassing characteristics were observed for the heated conditions. As the main impurity species $H_2,\;H_2O,\;N_2,\;CO_2,\;and\;H_2O$ were released from this panel. Impurity species of plasma treatment panel were lower than non-treated panels for the heating temperature

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