A study on Photolithography of band pass filter for communication devices

통신기기용 대역통과필터의 공정에 관한 연구

  • 이동윤 (중부대학교 정보공학부) ;
  • 신용덕 (원광대학교 전기전자 및 정보공학부)
  • Published : 2002.05.17

Abstract

SAW filters were fabricated on $LiNbO_3$ substrates to evaluate frequency response and properties of photolithography. In the both of etch and lift-off methods, lift off method was superior to etch method in fabrication process. Frequency response property was measured by network analyzer. From measurement of acoustic property, SAW propagation velocity was 3574.9m/sec for $LiNbO_3$ SAW filter.

Keywords