Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2002.05b
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- Pages.62-65
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- 2002
The electrical and optical properties of transparent ZnO:Al films using HCl wet chemical etching
HCL 습식 에칭에 의한 ZnO:Al 투명전도막의 전기적, 광학적 특성
- Yoo, Jin-Su ;
- Lee, Jeong-Chul ;
- Kang, Ki-Hwan ;
- Kim, Seok-Ki ;
- Yoon, Kyung-Hoon ;
- Song, Jin-Soo ;
- Park, I-Jun
- 유진수 (한국에너지기술연구원 태양광발전연구팀) ;
- 이정철 (한국에너지기술연구원 태양광발전연구팀) ;
- 강기환 (한국에너지기술연구원 태양광발전연구팀) ;
- 김석기 (한국에너지기술연구원 태양광발전연구팀) ;
- 윤경훈 (한국에너지기술연구원 태양광발전연구팀) ;
- 송진수 (한국에너지기술연구원 태양광발전연구팀) ;
- 박이준 (한국에너지기술연구원 태양광발전연구팀)
- Published : 2002.05.17
Abstract
Transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Coming 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCl (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure and the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures