Proceedings of the IEEK Conference (대한전자공학회:학술대회논문집)

The Institute of Electronics and Information Engineers (대한전자공학회)
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Structural and electrical properties of ZnO:Al, In thin film

ZnO:Al,In 박막의 구조적 및 전기적 특성

  • 박경일 (경상대학교 화학과) ;
  • 서무룡 (경상대학교 화학과) ;
  • 홍범표 (경상대학교 전자재료공학과 및 생산기술연구소) ;
  • 김정규 (경상대학교 전자재료공학과 및 생산기술연구소) ;
  • 전춘배 (연암공업전문대학) ;
  • 박기철 (경상대학교 전자재료공학과 및 생산기술연구소)
  • Published : 1998.06.01
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Abstract

NH$_{3}$ gas sensitive ZnO:Al, In thin films were prepared by the heat treatment following continuous deposition of very thin In layer and ZnO:Al layer to obtain the modified surface morphology for good sensitivity. Dependence of the structural electrical and optical properties of them on heat treatment temperature was investigated by x-ray diffraction, SEM, 4-point probe method and spectrophotometer.

Keywords