한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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- Pages.443-446
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- 2003
CMOS 공정에 의한 2차원 SSIMT의 제작 및 특성
Fabrication and characteristics of 2-Dimensional SSIMT using a CMOS Process
- 발행 : 2003.11.13
초록
A 2-Dimensional SSIMT(Suppressed Sidewall Injection Magnetotransistor) sensor with high linearity is presented in this paper. The prototype is fabricated by using the Hynix