ITO 박막의 $O_2$ 플라즈마 처리에 의한 휴지전기발광소자의 특성 향상

Improvement of Organic Electroluminescent Device Performance by $O_2$ Plasma Treatment of ITO Surface

  • 양기성 (동아대학교 전기공학과) ;
  • 김두석 (동아대학교 항만물류시스템공학과) ;
  • 김병상 (동아대학교 전기공학과) ;
  • 신훈규 (동아대학교 전기공학과) ;
  • 권영수 (동아대학교 전기공학과)
  • 발행 : 2004.04.24

초록

We treated $O_2$ plasma on ITO thin film using RIE (Reactive Ion Etching) system, and analyzed the ingredient of ITO thin film according to change of processing conditions. The ingredient analysis of ITO thin film was used by EDS (Energy Dispersive Spectroscopy) and XPS (X-ray Photoelectron Spectroscopy) to compare and analyze the ingredient of bulk and surface. We measured electrical resistivity using Four-Point-Probe and calculated sheet resistance, and ITO surface roughness was measured by using AFM (Atomic Force Microscope). Finally, we fabricated OLEDs (Organic Light-Emitting Diodes) device using substrate that was treated optimum ITO surface. The result of the study for electrical and optical properties using I V L System (Flat Panel Display Analysis System), we confirmed that electrical properties (I-V) and optical properties (L-V) were improved.

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