SEG Applications for Semiconductor Devices

선택적 단결정 실리콘 성장의 반도체 소자 적용

  • 정우석 (한국전자통신연구원 기반기술연구소)
  • Published : 2005.07.07

Abstract

Process diagrams of selective epitaxial growth of silicon(SEG) could be developed from CVD thermodynamics. They could not only be helpful with understanding of the mechanism, but also offer good processing guidelines in manufacturing high density devices. Through the process optimization skill, applications of SEG to high-density device structures could be possible without problems such as loading effect and facet generation, with producing outstanding electronic properties.

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