Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2005.05b
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- Pages.25-28
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- 2005
A Study of the Changes of Surface Properties on Semiconductive-Insulating of Silicone Rubber by Oxygen Plasma Treatment
산소 플라즈마 처리에 의한 반도전성 실리콘 고무 표면의 특성변화
- Lee, Ki-Taek (Inha University) ;
- Hwang, Sun-Mook (Inha University) ;
- Hong, Joo-Il (Inha University) ;
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Huh, Chang-Su
(Inha University)
- Published : 2005.05.27
Abstract
This paper was investigated the changes of surface properties of high-temperature-vulcanized(HTV) semiconductive silicone rubber due to oxygen plasma discharge. The modifications produced on the silicone surface by oxygen plasma were accessed using x-ray photoelectron spectroscopy(XPS), contact angle and Scanning Electron Microscope(SEM). The results of the chemical analysis showed that C-H bonds were broken due to plasma discharge and Silica-like bonds (SiOx. x=3~4) increased. It is thought that the above changes lead to the increase of surface energy of high-temperature-vulcanized(HTV) semiconductive silicone rubber. The micromorphology of surface and hydrophobicity due to plasma discharge based on our results were discussed.