한국정보디스플레이학회:학술대회논문집
- 2006.08a
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- Pages.509-512
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- 2006
Device Design Considerations and Uniformity Improvement for Low-Temperature Poly-Si TFTs Fabricated by Sequential Lateral Solidification Technology
- Chu, Fang-Tsun (Display Technology Center, Industrial Technology Research Institute) ;
- Shih, Ding-Kang (Display Technology Center, Industrial Technology Research Institute) ;
- Chen, Hung-Tse (Display Technology Center, Industrial Technology Research Institute) ;
- Yeh, Yung-Hui (Display Technology Center, Industrial Technology Research Institute)
- Published : 2006.08.22
Abstract
In this paper, we proposed the novel device and process design to enhance the uniformity of low-temperature poly-Si TFTs fabricated by sequential lateral solidification (SLS). The proposed design schemes can avert the conventional two-shot SLS process-induced issues. Moreover, different design considerations between conventional excimer laser crystallization and the SLS process were also proposed and discussed.
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