Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2006.06a
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- Pages.230-231
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- 2006
Properties of Sol-Gel Thin Films Containing Colloidal Silica and Alkoxysilanes
콜로이드 실리카 알콕시실란을 함유한 졸겔반응 경화박막 특성연구
- Myung, In-Hye (Korea Electrotechnology Research Institute) ;
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Ahn, Myeong-Sang
(Korea Electrotechnology Research Institute)
;
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Kang, Young-Taec
(Korea Electrotechnology Research Institute)
;
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Kang, Dong-Pil
(Korea Electrotechnology Research Institute)
- Published : 2006.06.22
Abstract
We synthesized sol according to kinds(particle size/stabilized ion) of colloidal silica(CS), content ratio of alkoxysilane versus CS and reaction degree in sol solution and studied the surface property of coated gel materials. The contact angle of the thin films prepared from LHSA/N1030 CS/tetramethoxysilane(TMOS)/methyltrimethoxysilane(MTMS) sol-gel reaction system showed a little good relationship with content ratio of TMOS/MTMS silanes. The surface roughness of LHSA CS/TMOS/MTMS reaction system showed flatter than that of LHSA/N1030 CS. The thermal degradation of LHSA CS/TMOS/MTMS coating flim occurred at