한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2006년도 영호남 합동 학술대회 및 춘계학술대회 논문집 센서 박막 기술교육
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- Pages.130-132
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- 2006
GROWTH OF AMORPHOUS CARBON THIN FILMS BY RF PLASMA CVD
- Ryu, J.T. (Daegu Univ.) ;
- Katayama, M. (Osaka Univ.) ;
- Baek, Y.G. (Osaka Univ.) ;
- Kim, Y.B. (Daegu Univ.) ;
- Oura, K. (Osaka Univ.)
- 발행 : 2006.05.19
초록
In this paper, the author describes a-C films grown in pure methane plasma without any diluent gas by using RF plasma-enhanced CVD, and the variations in their structural features and surface morphologies are examined as a function of substrate temperature. Raman spectroscopy and scanning electron microscopy were performed to characterize the properties of the film.