한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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- Pages.1071-1074
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- 2007
6 Mask LTPS CMOS Technology for AMLCD Application
- Park, Soo-Jeong (LCD R&D Center, LG.Philips LCD) ;
- Lee, Seok-Woo (LCD R&D Center, LG.Philips LCD) ;
- Baek, Myoung-Kee (LCD R&D Center, LG.Philips LCD) ;
- Yoo, Yong-Su (LCD R&D Center, LG.Philips LCD) ;
- Kim, Chang-Yeon (LCD R&D Center, LG.Philips LCD) ;
- Kim, Chang-Dong (LCD R&D Center, LG.Philips LCD) ;
- Kang, In-Byeong (LCD R&D Center, LG.Philips LCD)
- 발행 : 2007.08.27
초록
6Mask CMOS process in low temperature polycrystalline silicon thin film transistors (poly-Si TFTs) has been developed and verified by manufacturing a 6Mask CMOS AMLCD panel. The novel 6Mask CMOS process is realized by eliminating the storage mask, gate mask and via open mask of conventional structure.