Enhanced Control of OLED Deposition Processes by OVPD(R)

  • Schwambera, M. (AIXTRON AG, Kackertstr.) ;
  • Meyer, N. (AIXTRON AG, Kackertstr.) ;
  • Keiper, D. (AIXTRON AG, Kackertstr.) ;
  • Heuken, M. (AIXTRON AG, Kackertstr.) ;
  • Hartmann, S. (TU Braunschweig) ;
  • Kowalsky, W. (TU Braunschweig) ;
  • Farahzadi, A. (Institute of Physics (IA), RWTH Aachen University of Technology) ;
  • Niyamakom, P. (Institute of Physics (IA), RWTH Aachen University of Technology) ;
  • Beigmohamadi, M. (Institute of Physics (IA), RWTH Aachen University of Technology) ;
  • Wuttig, M. (Institute of Physics (IA), RWTH Aachen University of Technology)
  • Published : 2007.08.27

Abstract

The enhanced control of OLED deposition processes by Organic Vapor Phase Deposition $(OVPD^{(R)})$ is discussed. $OVPD^{(R)}$ opens a wide space of process control parameters. It allows the accurate and individual control of deposition layer properties like morphology and precise mixing of multi component layers (co-deposition) in comparison to conventional deposition manufacturing processes like e. g. VTE (vacuum thermal evaporation).

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