Development of Internal linear Inductively Coupled Plasma Sources for Large Area Flat Penal Display Processing

  • Lim, Jong-Hyeuk (Department of Materials Science and Engineering, Sungkyunkwan University) ;
  • Park, Jung-Kyun (Department of Materials Science and Engineering, Sungkyunkwan University) ;
  • Kim, Kyong-Nam (Department of Materials Science and Engineering, Sungkyunkwan University) ;
  • Yeom, Geun-Young (Department of Materials Science and Engineering, Sungkyunkwan University)
  • Published : 2007.08.27

Abstract

An inductively coupled plasma source with internaltype linear inductive antennas named as "multiple Utype antenna" was developed for the substrate size of $2,300mm\;{\times}\;2,000mm$. High density plasmas on the order of $1.18\;{\times}\;10^{11}\;cm^{-3}$ could be obtained and the RF power of 8kW with good plasma stability.

Keywords