Improvement of Si solar cell efficiency by using surface treatments on the antireflection coating layers and electrodes

  • Yang, Cheng (SKKU Advanced Institute of Nanotechnology (SAINT) Sungkyunkwan University) ;
  • Ryu, Seung-Heon (SKKU Advanced Institute of Nanotechnology (SAINT) Sungkyunkwan University) ;
  • Yoo, Won-Jong (SKKU Advanced Institute of Nanotechnology (SAINT) Sungkyunkwan University) ;
  • Kim, Dong-Ho (Semiconductor Device Laboratory, Sanaung Advanced Institute of Technology) ;
  • Kim, Teak (Semiconductor Device Laboratory, Sanaung Advanced Institute of Technology)
  • Published : 2009.05.27

Abstract

Plasma etching was studied to obtain high-efficiency Si solar cells. SiN nanoparticles were observed upon the plasma treatment using SF6 gas. The mechanism of the nanoparticles formation has been studied. A net increase in the current density (Jsc) of the cells of $1.7mA/cm^2$ and in the conversion efficiency ($\eta$) of 2.1% is obtained after the plasma treatment for 10s, thanks to the significant decrease of reflection in the shorter wavelength range.

Keywords