Surface Morphological Evolution during Chemical Dry Etching of Crystalline Si using F radicals and NO Gas

  • Ahn, J.H. (School of Advanced Materials Science& Engineering, SungKyunKwan University) ;
  • Heo, W. (School of Advanced Materials Science& Engineering, SungKyunKwan University) ;
  • Jung, C.R. (School of Advanced Materials Science& Engineering, SungKyunKwan University) ;
  • Lee, N.E. (School of Advanced Materials Science& Engineering, SungKyunKwan University)
  • Published : 2009.05.27