Infinite selective dry etching of ITO binary mask structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP)

Park, Y.R. (School of Advanced Materials Science & Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Chang, C.R. (School of Advanced Materials Science & Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Heo, W. (School of Advanced Materials Science & Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Kwon, B.S. (School of Advanced Materials Science & Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Park, J.S. (School of Advanced Materials Science & Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Lee, N.E. (School of Advanced Materials Science & Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Kang, H.Y. (Department of Physics, Inha University) ;
HwangBo, C.K. (Department of Physics, Inha University) ;
Seo, Hwan-Seok (Photomask Team, Memory Division, Semiconductor Business, Samsung Electronics Co., Ltd.)