Fabrication of Micro Wall with High Aspect Ratio using Iterative Screen Printing

  • Yoon, Seong-Man (Nano-Mechanical Systems Research Division, Korea Institute of Machinery & Materials) ;
  • Jo, Jeong-Dai (Nano-Mechanical Systems Research Division, Korea Institute of Machinery & Materials) ;
  • Yu, Jong-Su (Nano-Mechanical Systems Research Division, Korea Institute of Machinery & Materials) ;
  • Yu, Ha-Il (Nano-Mechanical Systems Research Division, Korea Institute of Machinery & Materials) ;
  • Kim, Dong-Soo (Nano-Mechanical Systems Research Division, Korea Institute of Machinery & Materials)
  • Published : 2009.10.12

Abstract

Micro wall is fabricated using iterative screen printing that it is able to fabricate the pattern as low cost, simple process, formation of pattern at large area on the various substrates. In the process of micro wall fabrication using screen printing, the printing result with pressure change in process and improvement of surface roughness using hydrophillic plasma treatment are included. Height of micro wall increase linearly and precision of iteration is very high. Error rate of printed pattern width is very high, but change rate of width is under 10 %. Fabricated micro pattern have minimum width $48.75{\mu}m$ and maximum height $75.45{\mu}m$ with aspect ratio 1.55.

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