Characteristics of Line-type Internal Inductively Coupled Plasma Source for Flexible Display Processing

  • Lim, Jong-Hyeuk (Department of Materials Science and Engineering, Sungkyunkwan University) ;
  • Kim, Kyong-Nam (Department of Materials Science and Engineering, Sungkyunkwan University) ;
  • Gweon, Gwang-Ho (Department of Materials Science and Engineering, Sungkyunkwan University) ;
  • Hong, Seung-Pyo (Department of Materials Science and Engineering, Sungkyunkwan University) ;
  • Yeom, Geun-Young (Department of Materials Science and Engineering, Sungkyunkwan University)
  • Published : 2009.10.12

Abstract

In this work we present a new type of line plasma source using an internal-type ICP operated at 2MHz with a ferrite module, describe the effect of ferrite module on the enhancement of the plasma properties and the uniformity, and compare to those obtained with 13.56MHz discharge. Also the electrical characteristics of the antenna line and the characteristics of the plasma uniformity were studied.

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