The Characterization of ZnO Hybrid Structure Grown by Metal-organic Chemical Vapor Deposition

  • 김아영 (고려대학교 신소재공학과) ;
  • 장삼석 (고려대학교 신소재공학과) ;
  • 이도한 (고려대학교 신소재공학과) ;
  • 임소영 (고려대학교 나노반도체공학과) ;
  • 변동진 (고려대학교 신소재공학과)
  • Published : 2011.10.27

Abstract

The growth of three-dimensional ZnO hybrid structures by metal-organic chemical vapor deposition was controlled through their growth pressure. Vertically aligned ZnO nanorods were grown on c-plane sapphire substrate at $600^{\circ}C$ and 400 Torr. ZnO film was then formed in-situ on the ZnO nanorods at $600^{\circ}C$ and 10 Torr. High-resolution X-ray diffraction and transmission electron microscopy measurements showed that the ZnO film on the nanorods/sapphire grew epitaxially, and that the ZnO film/nanorods hybrid structures had well-ordered wurtzite structures. The hybrid ZnO structure was shown to be about 5 ${\mu}m$ by field-emission scanning electron microscopy. The hybrid structure showed better crystalline quality than mono-layer film on sapphire substrate. Consequently, purpose of this work is developing high quality hybrid epi-growth technology using nano structure. These structures have potential applicability as nanobuilding blocks in nanodevices.

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