Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
권호 표지

Characteristics of Alumina Film Prepared by MOCVD

MOCVD법으로 제조된 알루미나 박막의 특성

  • 최두진 (한국과학기술연구원 무기재료연구실) ;
  • 임공진 (연세대학교 요업공학과) ;
  • 정형진 (한국과학기술연구원 무기재료연구실) ;
  • 송한상 (연세대학교 요업공학과) ;
  • 김창은 (연세대학교 요업공학과)
  • Published : 1990.06.01
Download PDF
⟨ Previous Next ⟩

Abstract

Al2O3 film was chemically deposited by pyrolytic decom,positio of the Al-tri-isopropoxide/N2 system at 350$^{\circ}C$, 30 and 1.86torr. FTIR analysis showed a deposited film was a hydrated alumina and transformed to an anhydrous one after heat treatment(1hr, >800$^{\circ}C$ or 4hr, >500$^{\circ}C$) in N2 atmosphere. This transformation influenced on the CV-hysteresis of Si-Al2O3 structure. Also, a pH sensitivity of EIS(Electrolyte-Insulator-Semiconductor)structure using Si-Al2O3/SiO2 film was 50mV/pH in the range of pH 3 to 7.

Keywords

References

  1. Surface Modification Technologies A Review of Chemical Vapor Deposition-Techniques, Materials and Applications Deepak G Bhat;T.S. Sudarshan(ed.);D.C. Bhat(ed.)
  2. Am. Cer. Soc. Bull. v.67 no.2 Advanced Ceramics by Chemical Vapor Deposition Techniques D.P. Stinton;T M Besmann;R.A. Lowden
  3. J. Electrochem, Soc. v.117 no.3 Interface Properties of Si-(SiO₂)Al₂O₃ Structures M.T. Duffy;A.G. Revesz
  4. Thesis, M.I.T. J.M. Woulbroun
  5. J. Electrochem. Soc. v.113 no.4 Phase Changes in Thin Reactively Sputtered Alumina Films R.G. Frieser
  6. Mat. Res. Bull. v.23 no.1 Preparation and Characterization of Thin Films of Alumina by Metal-Organic Chemical Vapor Deposition J. Fournier;W. Desisto;R. Brusasco;M. Sosnowski;R. Kershaw;J. Baglio;K. Dwight;A. Wold
  7. RCA Review Chemical Vapor Deposion of Aluminum Oxide Films from Organo-Aluminum Compounds M.T. Duffy;Werner Kern
  8. J. Electrochem Soc. v.114 no.9 Deposition and Properies of Aluminum Oxide Obtained by Pyrolytic Decomposition of An Aluminum Alkoxide J.A. Aboaf
  9. Paper 476 Presented at the Montreal Meeting of the Society H.E. Nigh
  10. Fundamentals of Silicon Integrated Device Technology v.1 Solid State Physical Electronics Series R.M. Burger;R.P. Donovan;N. Holonyak, Jr.(ed.)
  11. Application Note 322 Hewlett Packard Manual Anal. of Semicon. Capacit. Char.
  12. Proc., Dev., and Design. Modern MOS Tech D.G. Ong
  13. Theory, Design, and Biomedical Appl. of Solid State Chem. Sensors Application of Electrokinectic and Colloid Science Concepts to The Formulation of ISFET Device Physics J.F. Schenck;P.W. Cheng(ed.);D.G. Fleming(ed.);M.R. Neuman(ed.);W.H. Ko(ed.)
  14. Thin Film Processes Chemical Vapor Deposition of Inorganic Thin Film W K. Kern;V.S. Van;J L. Vossen(ed.);W.K. Kern(ed.)
  15. 요업재료의 과학과 기술 v.3 no.1 세라믹 박막에 관한 연구 최두진
  16. Ion Selective Electrode in Analytical Chemistry v.2 Chemically Sensitive Field Effect Transistor Jiri Janta;Robert J Huber;Freiser Henry(ed.)
  17. Metallurgical Transactions v.2 no.3 Dielectric and Interface Properties of Pyrolytic Aluminum Oxide Films on Silicon Substrate M.T. Duffy;J.E. Carnes;D. Richman
  18. Sol. St. Chem. Sensors J. Janta;R.J. Huber
  19. 요업재료의 과학과 기술 v.3 no.3 클로이드/계면 과학과 파인 세라믹스 성형 장현명
  20. Ultrastructure Processing of Advanced Structural and Electronic Materials G.Y. Onoda, Jr.;J.A. Casey;L.L. Hench(ed.)