Influence on the Chemical Durability of $B_2O_3-SiO_2$ and $Al_2O_3-SiO_2$ Thin Films at the Addition of $P_2O_5$

$P_2O_5$의 첨가가 $B_2O_3-SiO_2$$Al_2O_3-SiO_2$ 박막의 화학적내구성에 미치는 영향

  • 황규석 (전남대학교 공과대학 무기재료공학과) ;
  • 김병훈 (전남대학교 공과대학 무기재료공학과) ;
  • 최석진 (전남대학교 공과대학 무기재료공학과)
  • Published : 1993.08.01

Abstract

In order to increase chemical durability of thin films in binary system B2O3-SiO2 and Al2O3-SiO2 on the slide glass by the dip-coating technique from TEOS(Tetraethyl Orthosilicate) and boric acid or aluminum nitrate, phosphoric acid(5~20mol%) was added, respectively. Corrosion of acid and alkali of samples treated with 1N, HCl, NaOH and distilled water at 10$0^{\circ}C$ for 15 minute, were measured IR transmittance and variance of transmittance at visible range. Surface structure of thin film was investigated with SEM and formation of crystal phase according to additiion of phosphoric acid was measrued with XRD. In Al2O3-SiO2 system, change of remarkable characteristic was not obtained at the addition of P2O5 but transmittance of thin film was decreased with addition of P2O5 in B2O3-SiO2 system.

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References

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