스퍼터링 방법을 이용한 중금속 산화물 유리 박막의 증착

Deposition of Heavy Metal Oxide Glass Thin Films by R.F. Magnetron Sputtering

  • 김웅권 (포항공과대학교 재료.금속공학과) ;
  • 허종 (포항공과대학교 재료.금속공학과) ;
  • 제정호 (포항공과대학교 재료.금속공학과)
  • Kim, Woong-Kwern (Dept. of Mater. Sci. and Eng., Pohang Univ. of Sci. and TECH. (POSTECH)) ;
  • Heo, Jong (Dept. of Mater. Sci. and Eng., Pohang Univ. of Sci. and TECH. (POSTECH)) ;
  • Je, Jung-Ho (Dept. of Mater. Sci. and Eng., Pohang Univ. of Sci. and TECH. (POSTECH))
  • 발행 : 1995.06.01

초록

In this study, EO glass films were deposited by R.F. magnetron sputtering using EO glass target. The glass formation of the EO film was greatly dependent on the substrate temperature and the crystallization started at approximately 28$0^{\circ}C$. As the temperature of the substrate or the oxygen content in the sputtering gas increased, UV/VIS/NIR absorption edge moved toward longer wavelength. A wave guiding phenomenon was observed from the prism-coupler experiment and a fluorescence of 1.06${\mu}{\textrm}{m}$ originated from 4Fe3/2longrightarrow4I11/2 transition of Nd3+ was detected from the film containing Nd3+ ions.

키워드

참고문헌

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