The Effects of $SiN_x$ Dielectric Thin Films on SAW Properties of the High Frequency SAW Filter for Cellular Communication System

$SiN_x$유전 보호막이 이동통신용 고주파 SAW필터의 특성에 미치는 영향

  • 이용의 (서울대학교 공과대학 무기재료공학과) ;
  • 이재빈 (서울대학교 공과대학 무기재료공학과) ;
  • 김형준 (서울대학교 공과대학 무기재료공학과) ;
  • 김영진 (경기대학교 공과대학 재료공학과) ;
  • 양형국 (전자부품종합기술연구소 센서기기기연구팀) ;
  • 박종철 (전자부품종합기술연구소 센서기기기연구팀)
  • Published : 1995.09.01

Abstract

High frequency SAW filters for cellular communications were fabricated by metallizing 36$^{\circ}$Y-X LiTaO$_3$piezoelectric substrate with IIDT type electrodes. It was found that the center frequency of the filter was lowered than as designed. In order to overcome such a drawback and enable a fine tuning of its center frequency, dielectric SiN$_{x}$ thin films were deposited on LiTaO$_3$substrate by PECVD as passivation layer and then frequency responses were also characterized. As a result, the center frequency of the filter could be shifted to a higher frequency with increasing the thickness of SiN$_{x}$ film, because SAW velocity increased with increasing the ratio of the thickness of dielectric thin film to wavelength. The insertion loss of the filter, however, became larger with increasing the thickness of SiN$_{x}$ film.

이동통신용 고주파 표면탄성파(SAW) 필터를 36$^{\circ}$Y-X LiTaO$_3$압전기판과 IIDT 전극구조를 이용하여 제작하였다. 제작한 SAW 필터의 중심주파수는 주파수 응답 특성 측정 결과 설계한 중심주파수보다 낮아짐이 관찰되었다. 이러한 단점을 보완하고 미세한 주파수의 조절을 가능하게 하기 위해 SiN$_{x}$ 유전박막을 보호막으로 증착하여 이에 따른 주파수 특성 변화를 관찰하였다. SAW파장에 대한 SiN$_{x}$ 유전 박막의 두께비를 증가시킬수록 SAW 진행 속도가 증가하여, 제조한 필터의 중심주파수를 높게 이동시킬 수 있었다. 그러나 유전박막의 두께가 증가할수록 필터의 삽입손실이 증가하는 문제점이 존재하였다.

Keywords

References

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