References
- Silicides for VLSI Applications S.P.Muraka
- IBM J. Res. Develop. v.39 no.4 R.W.Mann;L.A.Clevenger;P.D.Agnello;F.R.White
- J. Vac. Sci. Technol. v.B4 no.6 S.P.Muraka
- J. Appl. Phys. v.64 R.W.Mann;L.A.Clenenger;Q.Z.Hong
- Appl. Phys. Lett. v.67 no.16 J.A.Kittl;D.A.Prinslow;P.P.Apte;M.F.Pas
- Appl. Phys. Lett. v.66 R.A.Roy;L.A.Clevenger;C.Cabral;K.L.Saenger;S.Brauer;J.Jordan-Sweet;J.Bucchitnano;G.B.Stephenson;G.Morales;K.F.ludwing,Jr.
- MRS symp. Proc. v.402 Silicide Thin Films-Fabrication, Properties, and Applications Paul,W.Pellegrini;Leslie,H.Allen
- J. Appl. Phys. v.67 no.10 Ivo J.M.M.Raaijmakers;ki-Bum Kim
- MRS symp. Proc. v.402 Silicide Thin Films-Fabrication, Properties, and Applications Paul,W.Pellegrini;Leslie H. Allen
- MRS symp. Proc. v.402 Silicide Thin Films-Fabrication, Properties, and Applications Paul,W.Pellegrini;Leslie H. Allen
- Metallization-Theory and Practice for VLSI and ULSI S.P.Muraka
- IEEE Trans. Electron. Dev. v.ED-34 no.3 Luc Vand Den Hove;Rob Wolters;Kaen Maex;Roger F. De Keersmaecker
- J. Appl. Phys. v.68 no.9 S.F.Gong;A.Robertsson;H.t.G.Hentzell;X.H.Li
- Jpn, J. Appl. Phys. v.34 Hiroshi Kotaki;Masayuki Nakano; Shigeki Hayashida;Seizou Kakimoto;Katsunori Mitsuhashi;Junkou Takagi
- J. Appl. Phys. v.72 no.5 S.L.Hsia;T.Y.Tan;P.Smith;G.E.Mcguire