CMP 공정에서 발생하는 연마온도 분포에 관한 연구

A Study on the Distribution of Friction Heat generated by CMP Process

  • 김형재 (부산대학교 정밀기계공학과) ;
  • 권대희 (부산대학교 정밀기계공학과) ;
  • 정해도 (부산대학교 정밀정형 및 금형가공 연구소) ;
  • 이용숙 (한국 기계연구원) ;
  • 신영재 (한국 기계연구원)
  • 발행 : 2003.03.01

초록

In this paper, we provide the results of polishing temperature distribution by way of infrared ray measurement system as well as polishing resistance, which can be interpreted as tribological aspects of CMP, using force measurement system. The results include the trend of polishing temperature, its distribution profile and temperature change during polishing. The results indicate that temperature affects greatly to the removal rate. Polishing temperature increases gradually and reaches steady state temperature and the period of temperature change occurs first tens of seconds. Furthermore, the friction force also varies as the same pattern with polishing temperature from high friction to low. These results suggest that the first period of the whole polishing time greatly affects the nonuniformity of removal rate.

키워드

참고문헌

  1. AT&T Bell Lab., 'CMP mechanism identified at Bell Lab.,' Solid State Technology, Vol. 37, No. 12, pp. 26, 1994
  2. Hocheng Hong, Huang Yun-Lian, Chen Lai-Juh, 'Kinematic Analysis and Measurement of Temperature Rise On a Pad in Chemical Mechanical Planarization,' J. of Electrochem. Soc., Vol. 146, No. 11, pp. 4236-4239, 1999 https://doi.org/10.1149/1.1392620
  3. Steigwald, J. M., 'Chemical mechanical planarization of microelectronic materials,' John Wiley & Sons, NY, pp. 74-83, 1997
  4. Karl-heinz, Zum gahr, Microstructure and Wear of Materials, Elsevier, NY, P. 72, 1987
  5. Yu, T. K., Yu, C. C., Orlowski, M., 'A Statistical Polishing Pad Model for Chemical Mechanical Polishing,' IEDM 93, pp. 865-868, 1993 https://doi.org/10.1109/IEDM.1993.347263
  6. Shan, L., 'Evaluation and Characterization of Polyurethan Chemical Mechanical Polishing Pads,' Ph. D Thesis, Clarkson Univ. 1998
  7. 弦 佐藤, 亮一本僑, PH を測ゐ, 東京 : 丸善, 1987
  8. Cook, L. M., 'Chemical process in glass polishing,' J. of Non-Crystalline Solids, Vol. 120, pp. 157-161, 1990
  9. Gunnarsson, I., Arnorsson, S., 'Amorphous Silica Solubility and the Thermodynamic Properties of H4SiO4 in the Rage of 0° to 350℃ at Psat,' Geochimica et Cosmochimica Acta, Vol. 64, No. 13, pp. 2295-2307, 2000 https://doi.org/10.1016/S0016-7037(99)00426-3
  10. Iler, R., 'The Chemistry of Silica,' Wiley,New York, 1979
  11. Fisher, M. L., et al., 'Effect of temperature and shear history on CMP slurry quality and their relation to wafer polish performance,' 2001CMP-MIC, 2001
  12. Gun'ko V.M., Zarko V.I., Leboda R., Chibowski E., 'Aqueous Suspension of Fumed Oxides: Particle size distribution and zeta potential,' Advances in Colloid and Interface Science, Vol. 91, p. 25, 2001 https://doi.org/10.1016/S0001-8686(99)00026-3